Digitaloptics Corporation Mems

Tessera Mems Technologies, Inc.

Shi-Sheng Lee

Roman Gutierrez

Robert J Calvet

Xiaolei Liu

Ankur Jain

Kumaraswamy Jayaraj

Davy Tong

A device may comprise a substrate formed of a first semiconductor material and a trench formed in the substrate. A second semiconductor material may be formed in the trench. The second semiconductor material may have first and second portions that are isolated with respect to one another and that are isolated with respect to the first semiconductor material.

MEMS isolation structures

A method and system for mitigating undesirable motion of the optics of a camera are disclosed. The system can include a stage and snubber assembly for defining motion of the camera optics. The stage and snubber assembly can include a stage assembly having a stage to which the optics are attachable, at least one wing formed upon the stage, and a snubber assembly configured to cooperate with the wing(s) so as to limit motion of the stage substantially to the desired direction of travel of the camera optics.

Triaxial snubber assembly

Growing community of inventors

Arcadia, CA, United States of America

Shi-Sheng Lee