Semes Co., Ltd.

Shi Hyun Park

Kyung Min Kim

In Hwang Park

Seung Eun Na

Eun Woo Jang

Je Myung Cha

The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a housing having an inner space therein; a treating container disposed within the inner space and having a treating space; a substrate support unit supporting a substrate in the treating space; a liquid supply unit supplying a liquid to the substrate supported by the substrate support unit; an exhaust unit exhausting a fume generated in the treating space; an airflow supply unit coupled to a top side of the housing and supplying a gas to form a downward airflow to the inner space; and a perforated plate disposed between the treating container and the airflow supply unit and discharging the gas to the inner space, and wherein the perforated plate comprises: a bottom portion and a side portion, the side portion comprising a first side portion, and the first side portion extending and upwardly inclining from the bottom portion to a first sidewall of the housing, and having a first hole for discharging the gas.

Apparatus for treating substrate

Provided are a guide pin configured to support a corner of a photo mask using a double slide structure, a photo mask supporting unit including the same, and a photo mask cleaning apparatus including the same. The photo mask supporting unit includes a supporting plate, a supporting shaft which supports the supporting plate from under the supporting plate, a supporting plate driver configured to rotate the supporting plate, and a guide pin provided as a plurality of guide pins on the supporting plate to support a photo mask and including at least one column protruding upward from a flat surface and having a first sliding portion and a second sliding portion formed on a side surface of the column to be inclined downward to have different angles.

Growing community of inventors

Seoul, South Korea

Shi Hyun Park