Mentor Graphics Corporation

Siemens Industry Software Gmbh

Sherif Hany Riad Mohammed Mousa

Jonathan James Muirhead

Sridhar Srinivasan

William Matthew Hogan

Jea Woo Park

Padmaja Susarla

Ahmed Abouelseoud

Michael White

Alex Joseph Pearson

A circuit design in a hierarchical description is analyzed. The analysis comprises identifying electrical properties of circuit blocks in the circuit design. Circuit components of the circuit design are associated with geometric elements of a layout design. Then instances of each of the circuit blocks are classified into groups of instances based on the electrical properties. Rule checking is performed on one or more groups in the groups of instances for each of the circuit blocks by analyzing geometric elements associate with components of one instance for each of the one or more groups.

Automatic identification of hierarchical cells based on selected properties for layout verification

Systems and methods for layout analysis using unit cell properties. A method includes receiving a layout design and analyzing the layout design to identify unit cells in the layout design. The method includes designating points of interest each corresponding to a respective one of the unit cells and classifying the unit cells into a plurality of classifications using the points of interest and the corresponding properties. The method includes identifying unique patterns of the unit cells, and producing a reduced layout including the unique patterns of unit cells. The method includes performing layout processing on the reduced layout and propagating the process results from each of the unique patterns of unit cells in the reduced layout to other unit cells of the layout design having the same classification.

System and method for layout analysis using point of interest patterns and properties

Aspects of the disclosed technology relate to techniques of pattern-based resolution enhancement. Surrounding areas for a plurality of geometric layout elements in a layout design are partitioned into geometric space elements. The plurality of geometric layout elements and the geometric space elements are grouped, through pattern classification, into geometric layout element groups and geometric space element groups, respectively. Optical proximity correction is performed for each of the geometric layout element groups and sub-resolution assist feature insertion is performed for each of the geometric space element groups. The results are applied to the plurality of geometric layout elements and the geometric space elements in the layout design.

Pattern-based optical proximity correction

Aspects of the disclosed technology relate to techniques of context-aware pattern matching and processing. A circuit design is analyzed to identity circuit components of interest. Reference layout patterns that are associated with the circuit components of interest are extracted from a layout design based on the association of circuit components of the circuit design with geometric elements of the layout design. Pattern matching is performed to identify layout patterns that match the reference layout patterns. The identified layout patterns are then processed.

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Beaverton, OR, United States of America

Sherif Hany Riad Mohammed Mousa