Boe Technology Group Co., Ltd.

Beijing Boe Optoelectronics Technology Co., Ltd.

Beijing Boe Sensor Technology Co., Ltd.

Shenkang Wu

Jian Li

Yue Geng

Jianxing Shang

Yizhe Li

Xin Li

Na Wei

Jian Ma

Peizhi Cai

Xuecheng Hou

Jinyu Li

Tingze Dong

Yuelei Xiao

Dongsheng Huang

Hui Liao

Zhenyu Wang

Hongliang Xu

Chao Sun

Kunjing Chung

Xingpan Sun

Haiyang Lu

Zhenwu Jiang

Jingjie Su

Qi Jing

Guowei Chen

Kuohai Wang

Xiao Xin

Chang Dai

Provided are a detection substrate and a ray detector. The detection substrate includes: a base substrate; a plurality of detection pixels located on the base substrate, at least one detection pixel serves as a detection marking pixel. The detection marking pixel includes: a storage capacitor, a first electrode plate of the storage capacitor coupled to a bias voltage end; a discharge circuit configured to write a signal of the bias voltage end into a second electrode plate of the storage capacitor under the control of a first scanning signal end; and a reading circuit coupled to an external reading circuit, the reading circuit configured to write the voltage of the second electrode plate of the storage capacitor into the external reading circuit and write a reference signal of the external reading circuit into the second electrode plate of the storage capacitor under the control of a second scanning signal end.

Detection substrate and ray detector

A patterning method of a film is disclosed. The method including: providing a film including a first surface; forming n etching barrier layers on the first surface of the film, and n is an integer larger than or equal to 2; and performing n etching processes on the film to form a recessed structure on the first surface using the n etching barrier layers as masks, the recessed structure includes n bottom surfaces respectively having different depths. Two adjacent etching processes of the n etching processes include a previous etching process and a subsequent etching process, and after the previous etching process is completed, a part of the n etching barrier layers is removed to form a mask for the subsequent etching process; a material of the part of the n etching barrier layers which is removed is different from a material of the mask of the subsequent etching process.

Patterning method of film, microfluidic device and manufacturing method thereof

A bio-information detection substrate and a gene chip are provided. The substrate includes a first main surface, the first main surface includes a test region and a dummy region located around the test region, at least one accommodation region is disposed on the first main surface, and the accommodation region is located in the dummy region.

Bio-information detection substrate and gene chip

The present disclosure relates to the field of display technology, and discloses a display panel and a manufacturing method. The display panel includes a first substrate, a second substrate, a liquid crystal, and a backlight module, wherein the first substrate includes a display area and a bonding area adjacent to the display area, and the display area of the first substrate on one side close to the second substrate is provided with thin film transistors arranged in an array mode; the second substrate is disposed opposite to the display area of the first substrate; the liquid crystal is encapsulated between the first substrate and the second substrate; the area of the second substrate is smaller than that of the first substrate, and the second substrate is between the first substrate and the backlight module.

Display panel and manufacturing method

Growing community of inventors

Beijing, China

Shenkang Wu