Au Optronics Corporation

Sheng-Kai Lin

Sheng-Ming Huang

Hui-Ku Chang

Jen-Kuei Lu

Ming-Jui Wang

Chih-Chiang Chen

Chia-Hsin Chung

Tsai-Sheng Lo

Wei-Chi Wang

Chih-Sheng Chang

Cheng-Chan Wang

Huang-Kai Shen

Chia-Po Lin

Han-Sheng Nian

Ying-Hui Lai

A polarizer substrate includes a substrate, a reflective layer, and a metal pattern layer. The reflective layer is located on the substrate and has a transmission area and a reflective area. The metal pattern layer is located on the reflective layer and the substrate. The metal pattern layer includes a polarizer structure and a microstructure. The polarizer structure includes a plurality of grid lines overlapping the transmission area. A thickness of each of the grid lines is 200 nm to 500 nm, a width of each of the grid lines is 30 nm to 70 nm, and a distance between each adjacent two of the grid lines is 30 nm to 70 nm. The microstructure overlaps the reflective area, and a thickness of the microstructure is 20 nm to 500 nm.

Polarizer substrate and manufacturing method thereof

An active device substrate including a substrate, first metal grid wires, a first transparent conductive layer, a gate insulating layer, a semiconductor layer, a source, and a drain is provided. The first metal grid wires are located on the substrate. The first transparent conductive layer includes a scan line and a gate connected to the scan line. The scan line and/or the gate is directly connected to at least a part of the first metal grid wires. The gate insulating layer is located on the first transparent conductive layer. The semiconductor layer is located on the gate insulating layer and overlapped with the gate. The source and the drain are electrically connected to the semiconductor layer.

Active device substrate and method for manufacturing the same

A polarizer substrate includes a substrate, an organic planarization layer, an inorganic buffer layer, and a plurality of strip-shaped polarizer structures. The organic planarization layer is located on the substrate. The inorganic buffer layer is located on the organic planarization layer. The inorganic buffer layer has a plurality of trenches located on a first surface. The trenches do not penetrate through the inorganic buffer layer. The strip-shaped polarizer structures are located on the first surface of the inorganic buffer layer. Each of the trenches is located between two adjacent polarizer structures. A display panel is also provided.

Polarizer substrate and display panel

An imprint mold and a method for manufacturing the same are provided. The imprint mold includes a plurality of substantially identical or different mold patterns, wherein there isn't any height difference between the mold patterns. The imprint mold manufacturing method includes: disposing a first layer on a substrate; disposing a first hard mask layer on the first layer, wherein the first hard mask layer includes one or more first hollow area; forming a first mold pattern on the first layer by imprinting, wherein the region of the first mold pattern completely overlaps the region of the vertical projection of the first hollow area on the first layer; removing the first hard mask layer; disposing a second hard mask layer on the first layer, wherein the second hard mask layer includes one or more second hollow area, wherein the region of the vertical projection of the second hollow area on the first layer is adjacent to the first mold pattern; forming a second mold pattern on the first layer by imprinting, wherein the region of the second mold pattern completely overlaps the region of the vertical projection of the second hollow area on the first layer; and removing the second hard mask layer.

Imprint mold and method for manufacturing the same

A wire grid polarizer and a display panel using the same are provided. The wire grid polarizer includes a substrate, a plurality of wire grids, a plurality of patterned light absorbing layers, and a surface covering layer. The plurality of wire grids are disposed on the substrate, wherein there are a plurality of gaps between every two wire grids. The plurality of patterned light absorbing layers are disposed corresponding to and overlapping the wire grids respectively, wherein every two of the patterned light absorbing layers have one of the gaps. The surface covering layer is disposed on the patterned light absorbing layers and directly contacts the patterned light absorbing layers.

Wire grid polarizer and display panel using the same

A touch polarizer and a touch display device are provided. The touch polarizer includes a first substrate, a transparent electrode layer, a wire-grid electrode layer, and a touch circuit. The transparent electrode layer is disposed on the first substrate. The wire-grid electrode layer is disposed on one side of the transparent electrode layer and includes a plurality of wires arranged parallel to each other and spaced to form a wire-grid. The touch circuit respectively connects to the transparent electrode layer and the plurality of wires and generates a touch signal based on a feedback from the transparent electrode layer and the wire-grid electrode layer.

Touch polarizer and touch display device

A display panel is provided. The display panel includes a first substrate, a second substrate, a sealing frame set, and a third adhesion portion. The first substrate has an inner surface which includes a superposed area and an exposed area on a side of the superposed area. The second substrate is disposed and superposed on the superposed area; the substrates have a space therebetween. The sealing frame set is located between the substrates and disposed along and insides an edge of the superposed area to enclose the space. The sealing frame set includes first and second sealing frames, wherein the first sealing frame connects the substrates and surrounds the superposed area, the second sealing frame surrounds an outer side of the first sealing frame. A third adhesion portion is located between the first and the second substrates, and between the second sealing frame and the exposed area.

Growing community of inventors

Hsin-Chu, Taiwan

Sheng-Kai Lin