Taiwan Semiconductor Manufacturing Comp. Ltd.

Sheng-chun Yang

Yi-Ming Lin

Chao-Hung Wan

Chih-Lung Cheng

Po-Chih Huang

Chen-Hao Liao

Min-Cheng Chung

A system and method for generating a gas curtain over an access port of a processing chamber for a semiconductor substrate. A gas flow stabilizer and a gas flow receiver, each including a horizontal flow section and a vertical flow section cooperate to generate a gas curtain that impedes gas, e.g., oxygen, from outside the processing chamber, from flowing into the chamber, for example, when the access port is opened to add/or to remove a workpiece from the processing chamber.

Systems and methods for processing a substrate

A diffuser for diffusing a gas includes a base portion and a head portion fluidly coupled to the base portion. The head portion includes a diffuser element configured to diffuse a first fraction of the gas through a circumference of the diffuser element and a second fraction of the gas through an end surface of the diffuser element. The head portion further includes a connecting structure having a first connecting portion configured to receive a portion of the diffuser element therein and a second connecting portion protruding outwardly from the first connecting portion and configured to couple to the base portion.

Diffuser and semiconductor processing system using same

Growing community of inventors

Hsinchu, Taiwan

Sheng-chun Yang