Intel Corporation

Other

Sheng C Li

Andrew James Brown

Robert Alan May

Rahul Jain

Sai Vadlamani

Rajesh M Sankaran

Kristof Darmawikarta

Amruthavalli Pallavi Alur

Prithwish Chatterjee

Lauren Ashley Link

Subramanya R Dulloor

Islam A Salama

Sri Ranga Sai Boyapati

Victor W Lee

Kyu Oh Lee

Robert L Sankman

Sanjay Kumar

Daehyun Kim

Jong Soo Park

Yikang Deng

Naveen K Mellempudi

Chong Zhang

Dingying David Xu

Ying Wang

Siddharth K Alur

Meizi Jiao

Dhiraj D Kalamkar

Hongxia Feng

Matthew L Tingey

Chung Kwang Christopher Tan

Yuxin Bai

Christopher J Hughes

Srinivas V Pietambaram

Edward Thomas Grochowski

Brandon C Marin

David A Koufaty

Cheng Xu

Junnan Zhao

Tarek A Ibrahim

Wei-Lun Kane Jen

Nadathur Rajagopalan Satish

Deborah T Marr

Jeremy D Ecton

Gang Duan

Mikhail Smelyanskiy

Sandeep B Sane

Yongki Min

Sri Chaitra Jyotsna Chavali

Asit K Mishra

Amanda E Schuckman

Mark S Hlad

Kyu-Oh Lee

Sri Chaitra J Chavali

Liang Zhang

Liwei Cheng

Haifa Hariri

Tamil Selvy Selvamuniandy

Shihao Ji

Sri Chaitra Chavali

Zhihua Zou

Michael A Anderson

Mostofa Ali Patwary

Narayanan Sundaram

An integrated circuit (IC) package substrate, comprising a magnetic material embedded within a dielectric material. A first surface of the dielectric material is below the magnetic material, and a second surface of the dielectric material, opposite the first surface, is over the magnetic material. A metallization level comprising a first metal feature is embedded within the magnetic material. A second metal feature is at an interface of the magnetic material and the dielectric material. The second metal feature has a first sidewall in contact with the dielectric material and a second sidewall in contact with the magnetic material.

In-plane inductors in IC packages

A package substrate and package assembly including a package substrate including a substrate body including electrical routing features therein and a surface layer and a plurality of first and second contact points on the surface layer including a first pitch and a second pitch, respectively, wherein the plurality of first contact points and the plurality of second contact points are continuous posts to the respective ones of the electrical routing features. A method including forming first conductive vias in a package assembly, wherein the first conductive vias include substrate conductive vias to electrical routing features in a package substrate and bridge conductive vias to bridge surface routing features of a bridge substrate; forming a first surface layer and a second surface layer on the package substrate; and forming second conductive vias through each of the first surface layer and the second surface layer to the bridge conductive vias.

Method to enable 30 microns pitch EMIB or below

A microelectronic device is formed to include an embedded die substrate on an interposer; where the embedded die substrate is formed with no more than a single layer of transverse routing traces. In the device, all additional routing may be allocated to the interposer to which the embedded die substrate is attached. The embedded die substrate may be formed with a planarized dielectric formed over an initial metallization layer supporting the embedded die.

Microelectronic device with embedded die substrate on interposer

Methods/structures of forming embedded inductor structures are described. Embodiments include forming a first interconnect structure on a dielectric material of a substrate, selectively forming a magnetic material on a surface of the first interconnect structure, forming an opening in the magnetic material, and forming a second interconnect structure in the opening. Build up layers are then formed on the magnetic material.

Methods of embedding magnetic structures in substrates

Techniques for mounting a semiconductor chip in a circuit board assembly includes using different buildup materials on opposite sides of a core to optimize stress in the first level interconnect structure (between the chip and core) and/or the second level interconnect structure (between the core and circuit board). The core can be, for example, ceramic, glass, or glass cloth-reinforced epoxy. In one example, the first side of the core has one or more layers of conductive material within a first buildup structure comprising a first buildup material. The second side of the substrate has one or more layers of conductive material within a second buildup structure comprising a second buildup material different from the first buildup material. In another example, an outermost layer of the second buildup structure is a ductile material that functions to decouple stress in the interconnect between the substrate and a circuit board.

Package substrate with reduced interconnect stress

Described herein are magnetic core inductors (MCI) and methods for manufacturing magnetic core inductors. A first embodiment of the MCI can be a snake-configuration MCI. The snake-configuration MCI can be formed by creating an opening in a base material, such as copper, and providing a nonconductive magnetic material in the opening. The inductor can be further formed by forming plated through holes into the core material. The conductive elements for the inductor can be formed in the plated through holes. The nonconductive magnetic material surrounds each conductive element and plated through hole. In embodiments, a layered coil inductor can be formed by drilling a laminate to form a cavity through the laminate within the metal rings of the layered coil inductor. The nonconductive magnetic material can be provided in the cavity.

Magnetic core inductors

Embodiments include package substrates and method of forming the package substrates. A package substrate includes a first encapsulation layer over a substrate, and a second encapsulation layer below the substrate. The package substrate also includes a first interconnect and a second interconnect vertically in the first encapsulation layer, the second encapsulation layer, and the substrate. The first interconnect includes a first plated-through-hole (PTH) core, a first via, and a second via, and the second interconnect includes a second PTH core, a third via, and a fourth via. The package substrate further includes a magnetic portion that vertically surrounds the first interconnect. The first PTH core has a top surface directly coupled to the first via, and a bottom surface directly coupled to the second via. The second PTH core has a top surface directly coupled to the third via, and a bottom surface directly coupled to the fourth via.

Sandwich-molded cores for high-inductance architectures

A substrate for an integrated circuit package, the substrate comprising a dielectric, at least one conductor plane within the dielectric, and a planar magnetic structure comprising an organic magnetic laminate embedded within the dielectric, wherein the planar magnetic structure is integrated within the at least one conductor plane.

Release layer-assisted selective embedding of magnetic material in cored and coreless organic substrates

Embodiments include semiconductor packages. A semiconductor package includes a plurality of build-up layers and a plurality of conductive layers in the build-up layers. The conductive layers include a first conductive layer and a second conductive layer. The first conductive layer is over the second conductive layer and build-up layers, where a first via couples the first and second conductive layers. The semiconductor package also includes a thin film capacitor (TFC) in the build-up layers, where a second via couples the TFC to the first conductive layer, and the second via has a thickness less than a thickness of the first via. The first conductive layer may be first level interconnects. The build-up layers may be dielectrics. The TFC may include a first electrode, a second electrode, and a dielectric. The first electrode may be over the second electrode, and the dielectric may be between the first and second electrodes.

Methods to pattern TFC and incorporation in the ODI architecture and in any build up layer of organic substrate

Microelectronic devices with an embedded die substrate on an interposer are described. For example, a microelectronic device includes a substrate housing an embedded die. At least one surface die is retained above a first outermost surface of the substrate. An interposer is retained proximate a second outermost surface of the substrate.

An apparatus system is provided which comprises: a substrate; a metal pillar formed on the substrate, the metal pillar comprising a first section and a second section, wherein the first section of the metal pillar is formed by depositing metal in a first opening of a first photoresist layer, and wherein the second section of the metal pillar is formed by depositing metal in a second opening of a second photoresist layer.

Formation of tall metal pillars using multiple photoresist layers

Methods/structures of forming in-package inductor structures are described. Embodiments include a substrate including a dielectric material, the substrate having a first side and a second side. A conductive trace is located within the dielectric material. A first layer is on a first side of the conductive trace, wherein the first layer comprises an electroplated magnetic material, and wherein a sidewall of the first layer is adjacent the dielectric material. A second layer is on a second side of the conductive trace, wherein the second layer comprises the electroplated magnetic material, and wherein a sidewall of the second layer is adjacent the dielectric material.

Magnetic inductor structures for package devices

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Chandler, AZ, United States of America

Sheng C Li