United Microelectronics Corp.

Shen-De Wang

Wang Xiang

Chia-Ching Hsu

Zhen Chen

Ko-Chi Chen

Wei Ta

Liang Yi

Weichang Liu

Chih-Chien Chang

Chun-Sung Huang

Yi-Shan Chiu

Chien-Hung Chen

Jianjun Yang

Wen-Chung Chang

Cheng-Hua Yang

Yuan-Hsiang Chang

Wei-Chang Liu

Ya-Huei Huang

Feng-Ji Tsai

Wei Cheng

Chuan Sun

Kok Wun Tan

Yu-Cheng Tung

Tzu-Ping Chen

Aaron Chen

Guoan Du

Wen-Peng Hsu

Tzeng-Fei Wen

Linggang Fang

Ling-Gang Fang

Fan-Chi Meng

Che-Jung Hsu

Pei-Chen Kuo

Shang Xue

Yung-Lin Tseng

Dongdong Li

A semiconductor memory structure includes a substrate having a device cell region and a contact forming region in proximity to the device cell region. A memory cell transistor is disposed within the device cell region. The memory cell transistor includes a gate and a charge storage structure between the gate and the substrate. The gate includes an extended portion within the contact forming region. A first spacer is disposed on a sidewall of the gate within the device cell region. A second spacer is disposed on a sidewall of the extended portion of the gate within the contact forming region. The second spacer is higher than the first spacer.

Semiconductor memory structure and fabrication method thereof

A power device includes a substrate, an ion well in the substrate, a body region in the ion well, a source doped region in the body region, a drain doped region in the ion well, and gates on the substrate between the source doped region and the drain doped region. The gates include a first gate adjacent to the source doped region, a second gate adjacent to the drain doped region, and a stacked gate structure between the first gate and the second gate.

Power device and fabrication method thereof

A RRAM (resistive random-access memory) device includes a bottom electrode line, a top electrode island and a resistive material. The bottom electrode line is directly on a first metal structure. The top electrode island is disposed beside the bottom electrode line. The resistive material is sandwiched by a sidewall of the bottom electrode line and a sidewall of the top electrode island. The present invention also provides a method of forming the RRAM device.

Method for forming resistive random-access memory device

A RRAM (resistive random-access memory) device includes a bottom electrode line, a top electrode island and a resistive material. The bottom electrode line is directly on a first metal structure. The top electrode island is disposed beside the bottom electrode line. The resistive material is sandwiched by a sidewall of the bottom electrode line and a sidewall of the top electrode island. The present invention also provides a method of forming said RRAM device.

Resistive random-access memory (RRAM) device and forming method thereof

A semiconductor device includes a semiconductor substrate, a gate structure, a source region, a drain region, a first oxide layer, a field plate, and a second oxide layer. The gate structure is disposed on the semiconductor substrate. The source region and the drain region are disposed in the semiconductor substrate and located at two opposite sides of the gate structure respectively. The first oxide layer includes a first portion disposed between the gate structure and the semiconductor substrate and a second portion disposed between the gate structure and the drain region. The field plate is partly disposed above the gate structure and partly disposed above the second portion of the first oxide layer. The second oxide layer includes a first portion disposed between the field plate and the gate structure and a second portion disposed between the field plate and the second portion of the first oxide layer.

Semiconductor device

A semiconductor device with integrated memory devices and metal-oxide-semiconductor (MOS) devices, including a substrate with a first area and a second area, multiple double-diffused metal-oxide-semiconductor (DMOS) devices on the first area, wherein the double-diffused metal-oxide-semiconductor (DMOS) device includes a field oxide on the substrate, a first gate dielectric layer adjacent to the field oxide, and a first polysilicon gate on the field oxide and the first gate dielectric layer, and multiple memory units on the second area, wherein the memory unit includes an oxide-nitride-oxide (ONO) tri-layer and a second polysilicon gate on the oxide-nitride-oxide (ONO) tri-layer, wherein a top surface of the second polysilicon gate of the memory unit in the second area and a top surface of the first polysilicon gate of the double-diffused metal-oxide-semiconductor (DMOS) in the first area are on the same level.

Semiconductor device with integrated memory devices and MOS devices and process of making the same

A memory device includes a main cell on a substrate, a first reference cell adjacent to one side of the main cell, and a second reference cell adjacent to another side of the main cell. Preferably, the main cell includes a first gate electrode on the substrate, a second gate electrode on one side of the first gate electrode and covering a top surface of the first gate electrode, a first charge trapping layer between the first gate electrode and the second gate electrode and including a first oxide-nitride-oxide (ONO) layer, a third gate electrode on another side of the first gate electrode and covering the top surface of the first gate electrode, and a second charge trapping layer between the first gate electrode and the third gate electrode and including a second ONO layer.

Memory device and method for fabricating the same

A semiconductor device includes a substrate, having cell region and high-voltage region. A memory cell is on the substrate within the cell region. The memory cell includes a memory gate structure and a selection gate structure on the substrate. A first spacer is sandwiched between or respectively on sidewalls of the memory cell structure and the selection gate structure. First high-voltage transistor is on the substrate within the high-voltage region. A first composite gate structure of the first high-voltage transistor includes a first gate structure on the substrate, an insulating layer with a predetermined thickness on the substrate in a-like structure or an L-like structure at cross-section, and a second gate structure on the insulating layer along the-like structure or the L-like structure. The selection gate structure and the second gate structure are originated from a same preliminary conductive layer.

Structure of semiconductor device and method for fabricating the same

A method of integrating memory and metal-oxide-semiconductor (MOS) processes is provided, including steps of forming an oxide layer and a nitride layer on a substrate, forming a field oxide in a first area by an oxidation process with the nitride layer as a mask, wherein the oxidation process simultaneously forms a top oxide layer on the nitride layer, removing the top oxide layer, the nitride layer and the oxide layer in the first area, forming a polysilicon layer on the substrate, and patterning the polysilicon layer into MOS units in the first area and memory units in a second area.

A method for fabricating semiconductor device includes the steps of: forming a first gate structure on a substrate; forming a second gate structure on the substrate and on one side of the first gate structure; forming a third gate structure on the substrate and on another side of the first gate structure; forming source/drain regions adjacent to the second gate structure and the third gate structure; and forming contact plugs to contact the first gate structure, the second gate structure, the third gate structure, and the source/drain regions.

Semiconductor device and method for fabricating the same

A semiconductor device and a manufacturing method thereof are provided. The semiconductor device includes a first gate, a gate dielectric layer, a pair of second gates, a first spacer, and a second spacer. The first gate is disposed on a substrate. The gate dielectric layer is disposed between the first gate and the substrate. The pair of second gates are disposed on the substrate and respectively located at two sides of the first gate, wherein top surfaces of the pair of second gates are higher than a top surface of the first gate. The first spacer is disposed on sidewalls of the pair of second gates protruding from the top surface of the first gate and covers the top surface of the first gate. The second spacer is disposed between the gate dielectric layer and the pair of second gates, between the first gate and the pair of second gates, and between the first spacer and the pair of second gates.

Semiconductor device with high-resistance gate

A memory structure including a substrate, at least one stacked gate structure, a first spacer conductive layer, and a first contact is provided. The stacked gate structure is located on the substrate and includes a control gate. The control gate extends in a first direction. The first spacer conductive layer is located on one sidewall of the control gate and is electrically insulated from the control gate. The first spacer conductive layer includes a first merged spacer portion and a first non-merged spacer portion. A line width of the first merged spacer portion is greater than a line width of the first non-merged spacer portion. The first contact is connected to the first merged spacer portion. The memory structure can have a larger process window of contact.

Memory structure

A manufacturing method of a semiconductor device includes: providing a substrate having memory and high voltage regions; sequentially forming a floating gate layer and a hard mask layer on the substrate; patterning the hard mask layer to form a first opening exposing a portion of the floating gate layer in the range of the memory region; patterning the hard mask layer and the floating gate layer to form a second opening overlapped with the high voltage region; performing a first thermal growth process to simultaneously form a first oxide structure on the portion of the floating gate layer exposed by the first opening, and to form a second oxide structure on a portion of the substrate overlapped with the second opening; removing the hard mask layer; and patterning the floating gate layer by using the first oxide structure as a mask.

Manufacturing method of semiconductor device

A method of manufacturing FinFET semiconductor devices in memory regions and logic regions includes the steps of forming a first gate material layer on a substrate and fins, patterning the first gate material layer to form a control gate, forming a second gate material layer on the substrate and fins, performing an etch process to the cell region so that the second gate material layer in the cell region is lower than the second gate material layer in the peripheral region, patterning the second gate material layer to form a select gate in the cell region and a dummy gate in the logic region respectively.

Growing community of inventors

Hsinchu County, Taiwan

Shen-De Wang