Globalfoundries Inc.

Other

Globalfoundries U.S. Inc.

Sheldon Meyers

Erik Robert Hosler

Chad E Uckermark

Michael Schrlau

Edmund Kenneth Banghart

Sandeep Gaan

Shishir K Ray

Robert Finlay

Nisha Pillai

Kyle Jung

Scott Kenny

The present invention is a conveyor belt cleaning apparatus, comprising: a case, wherein the case is designed to secure to a conveyor belt assembly; a frame member, wherein the frame member is secured to the case; at least one applicator attached to the frame member; tubing attached to the frame member and directly in contact with the applicator; at least one pump connected to the tubing; a solution reservoir connected to the at least one pump.

Method and apparatus for cleaning and sanitizing a conveyor belt

A conveyor belt cleaning apparatus, comprising; a case, wherein the case is designed to secure to a conveyor belt assembly; a frame member, wherein the frame member is secured to the case; at least one spray nozzle attached to the frame member; at least one pump connected to the at least one spray nozzle; a solution reservoir connected to the at least one pump; at least one applicator attached to the frame member and positioned relative to the at least one spray nozzle.

Method and apparatus for cleaning and sanitizing conveyor belts

An EUV photoresist composition includes paramagnetic particles that are adapted to block EUV radiation. The magnetic manipulation of the paramagnetic particles within a deposited layer of EUV photoresist can beneficially impact focus control and the achievable line width roughness during subsequent photolithographic processing. A spin-coating apparatus for dispensing the EUV photoresist composition onto a substrate includes a plurality of concentric electromagnets located beneath the substrate that influence the distribution of the paramagnetic particles in the photoresist layer.

Uniformity control of metal-based photoresists

A method includes identifying a contamination region of a collector in a light source, positioning a subset of a plurality of movable light-blocking elements around a periphery of a circular aperture of the light source to compensate for the contamination region, and transmitting light from the light source through the circular aperture.

Radial lithographic source homogenizer

A method includes identifying a first contamination region of a collector of a light source and enabling a subset of a plurality of temperature control elements positioned on the collector to cause a second contamination region to be formed on the collector symmetric to the first contamination region.

Balancing collector contamination of a light source by selective deposition

Semiconductor substrates and methods for processing semiconductor substrates are provided. A method for processing a semiconductor substrate includes providing a semiconductor substrate having an outer edge, a central region, and a peripheral region between the outer edge and the central region. The semiconductor substrate also has an upper surface. The method includes forming an amorphous material over the upper surface of the semiconductor substrate in the peripheral region. Also, the method includes irradiating the upper surface of the semiconductor substrate, wherein the amorphous material inhibits cracking at the outer edge of the semiconductor substrate.

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Halfmoon, NY, United States of America

Sheldon Meyers