Leybold Materials Gmbh

Leybold Material Gmbh

Shawn Vahlstrom

Martin Schlott

Martin Kutzner

Bruce Gehman

Martin Weigert

Uwe Konietzka

Wolfgang Dauth

An indium oxide/tin oxide powder with 5-15 wt. % tin oxide is subjected to an annealing treatment at T&gE;1, 000&deg; C. and is then partially reduced and subjected to hot isostatic pressing to produce a sputtering target with a density of at least 95% of the theoretical density and a thermal conductivity of at least 14 Wm,K,.

Method of preparing indium oxide/tin oxide target for cathodic sputtering

A target for production of transparent electrically conductive layers by cathode sputtering is produced from indium oxide-tin oxide powder mixtures or coprecipitated indium oxide-tin oxide powders. A target with especially high mechanical strength consists of an oxide ceramic material into which metallic phase components have been incorporated in a uniform and finely distributed manner and which has a density of more than 96% of the theoretical density of indium oxide/tin oxide consisting purely of oxide.

Sputter target for cathodic atomization to produce transparent,

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Morgan Hill, CA, United States of America

Shawn Vahlstrom