Merck Patent Gmbh

Sigma-aldrich Co. LLC

Safc Hitech, Inc.

Shaun Garratt

Ravi Kanjolia

David P Thompson

Jeffrey W Anthis

Rajesh Odedra

Paul Williams

Mark Saly

David Thompson

Jeffrey Anthis

Molybdenum complexes and use thereof in thin film deposition, such as CVD and ALD are provided herein. The molybdenum complexes correspond in structure to Formula (I): wherein R, R, R, R, R, R, R, R, R, and Rare independently selected from the group consisting of hydrogen, alkyl, and trialkylsilyl; and at least one of R, R, R, R, R, R, R, R, R, and Ris trialkylsilyl. 

Molybdenum silylcyclopentadienyl and silylallyl complexes and use thereof in thin film deposition

Metal complexes containing one or more amidoimine ligands, methods of making such metal complexes, and methods of using such metal complexes to prepare metal-containing films are provided. 

Metal complexes containing amidoimine ligands

Manganese complexes, methods of making the same, and use thereof in thin film deposition, such as CVD and ALD are provided herein.

Manganese complexes and use thereof for preparing thin films

Molybdenum complexes and use thereof in thin film deposition, such as CVD and ALD are provided herein. The molybdenum complexes correspond in structure to Formula (I) and Formula (II), wherein R, R, R, R, Rand Rare independently and at each occurrence alkyl; R, Rand Rare independently alkyl; Rand Rare independently and at each occurrence selected from the group consisting of alkyl, alkenyl, and alkynyl; x, z, a, c, d and f are independently zero, 1, or 2; y, b and e are independently zero or 1; and n and m are independently zero to 5. 

Molybdenum allyl complexes and use thereof in thin film deposition

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Wirral, United Kingdom

Shaun Garratt