Intel Corporation

Shashi Vyas

Charles Henry Wallace

Sudipto Naskar

An integrated circuit structure includes a first interconnect level including a first dielectric between a pair of interconnect structures, a second interconnect level above the first interconnect level. The second interconnect level includes a cap structure including a second dielectric on the first dielectric, the cap structure includes a top surface and a sidewall surface and a liner comprising a third dielectric on the top surface and on the sidewall surface.

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Hillsboro, OR, United States of America

Shashi Vyas