Taiwan Semiconductor Manufacturing Comp. Ltd.

Shang-Ting Tsai

Yu-Liang Lin

Henry Lo

Syun-Ming Jang Jang

Chung-Long Chang

Ai-Sen Liu

Ping-Hsu Chen

Ping Chuang

Yu-Huei Chen

Chao-Jung Chang

Jui-Cheng Lo

A method of unblinding an alignment mark comprising the following steps. A substrate having a cell area and an alignment mark within an alignment area is provided. An STI trench is formed into the substrate within the cell area. A silicon oxide layer is formed over the substrate, filling the STI trench and the alignment mark. The silicon oxide layer is planarized to form a planarized STI within the STI trench and leaving silicon oxide within the alignment mark to form a blinded alignment mark. A wet chemical etchant is applied within the alignment mark area over the blinded alignment mark to at least partially remove the silicon oxide within the alignment mark. The remaining silicon oxide is removed from within the blinded alignment mark to unblind the alignment mark. A drop etcher apparatus is also disclosed.

Method to solve alignment mark blinded issues and technology for application of semiconductor etching at a tiny area

A method and system for monitoring the quality of a slurry utilized in a chemical mechanical polishing operation. A slurry is generally delivered through a tubular path during a chemical mechanical polishing operation. A laser light is generally transmitted from a laser light source, such that the laser light comes into contact with the slurry during the chemical mechanical polishing operation. The laser light can then be detected, after the laser light comes into contact with the slurry to thereby monitor the quality of the slurry utilized during the chemical mechanical polishing operation. The laser light that comes into contact with the slurry can be also be utilized to monitor a mixing ratio associated with the slurry.

Method and system for in-situ monitoring of mixing ratio of high selectivity slurry

Method to solve alignment mark blinded issues and a technology for application of semiconductor etching at a tiny area

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Hsin-Chu, Taiwan

Shang-Ting Tsai