University of Washington

Shane Colburn

Arka Majumdar

Alan Zhan

Metasurfaces and systems including metasurfaces for imaging and methods of imaging are described. Such metasurfaces may be formed on a substrate from a plurality of posts. The metasurfaces are configured to be optically active over a wavelength range and in certain embodiments are configured to form lenses. In particular, the metasurfaces described herein may be configured to focus light passed through the metasurface in an extended depth of focus. Accordingly, the disclosed metasurfaces are generally suitable for generating color without or with minimal chromatic aberrations, for example, in conjunction with computational reconstruction.

Metasurfaces for full-color imaging

Systems and methods for simultaneous focal length control and achromatic computational imaging with quartic metasurfaces are disclosed herein. In one embodiment, an imaging system includes: a first metalens having a plurality of first nanoposts carried by a first substrate; a second metalens having a plurality of second nanoposts carried by a second substrate; and a source of light configured to emit light toward the first metalens and the second metalens. The first metalens is transversely offset with respect to the second metalens.

Simultaneous focal length control and achromatic computational imaging with quartic metasurfaces

Disclosed herein are metasurfaces formed on a substrate from a plurality of posts. The metasurfaces are configured to be optically active at one or more wavelengths and in certain embodiments are configured to form lenses having unexpectedly strong focusing power. In particular, the metasurfaces are formed from 'low-contrast' materials, including CMOS-compatible materials such as silicon dioxide or silicon nitride. Accordingly, the disclosed metasurfaces are generally CMOS compatible and therefore embody a new paradigm in metasurface design and manufacturing.

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Seattle, WA, United States of America

Shane Colburn