Tpk Advanced Solutions Inc.

Tpk Touch Solutions Inc.

Tpk Glass Solutions (xiamen) Inc.

Shan-Yu Wu

Chih-Min Chen

Chien-Hsien Yu

Ho-Hsun Chi

Fang Fang

Chao-Hui Kuo

Chao-Sung Li

Li-Wei Mu

Yi-Min Jiang

Xi-Zhao Wang

Chia-Hao Hsu

Chen-Hsin Chang

Chia Jui Lin

Cheng-Chieh Chang

Wei-Na Cao

Wei-Chuan Chao

Zheng-pang Huang

Hong-Yan Lian

Xue-Wei Wei

Can-Liang Zhao

Zhi-Xiong Chen

Chun-Wei Liu

Zheng-Pang Huang

The present disclosure provides a contact structure and an electronic device having the same. The contact structure includes: a substrate; a copper layer disposed on the substrate; an adhesion promotion layer disposed on the copper layer, wherein the adhesion promotion layer forms a monomolecular adsorption layer on the surface of the copper layer; and a silver nanowire layer disposed on the adhesion promotion layer, and the adhesive force between the copper layer and the silver nanowire layer is 3B or more. In the present disclosure, by disposing the adhesion promotion layer on the copper layer, in the stacked structure of the copper layer and the silver nanowire layer, the adhesive force between the copper layer and the silver nanowire layer is increased, so as to prevent a peeling phenomenon of the copper layer occurring in the subsequent yellow-light process.

Contact structure and electronic device having the same

The present disclosure provides a contact structure and an electronic device having the same. The contact structure includes a substrate, a copper layer, an organic composite protective layer, and a silver nanowire layer. The copper layer is disposed on the substrate. The nanowire-distribution-promotion layer is disposed between the copper layer and the silver nanowire layer.

A touch panel has a substrate having a display region and a peripheral region, a touch sensing electrode disposed in the display region of the substrate, and a peripheral circuit disposed in the peripheral region of the substrate. The touch sensing electrode is electrically connected to the peripheral circuit, and the touch sensing electrode layer includes a first portion of a patterned metal nanowire layer. The peripheral circuit includes a patterned conductive layer and a second portion of the metal nanowire layer. At least a non-conductive material of the conductive layer is between the peripheral circuit and a second peripheral circuit.

Touch panel and manufacturing method thereof

A touch panel includes a substrate having a display area and a peripheral area. A peripheral circuit is disposed in the peripheral area. The peripheral circuit comprises at least one bonding pad made of a metal layer. A plurality of touch sensing electrodes is disposed in the display area. The plurality of touch sensing electrodes is made of a metal nanowire layer, a film layer disposed on the metal nanowire layer, and a negative-type photosensitive layer disposed on the film layer. The plurality of touch sensing electrodes is electrically connected to the peripheral circuit.

Touch panel

A direct patterning method of touch panel is provided. A substrate having a display region and a peripheral region is provided. A periphery circuit having a bonding pad is disposed on the periphery region. A metal nanowire layer made of metal nanowires are disposed on the display region and the peripheral region. A photosensitive pre-cured layer is disposed on the metal nanowire layer. A photolithography process is performed, which includes exposing the pre-cured layer to define a removal area and a reserved area, and removing the pre-cured layer and the metal nanowire layer on the removal area using a developer solution to form a touch-sensing electrode disposed on the display region and to expose the bonding pad disposed on the periphery region. The touch sensing electrode made of the pre-cured layer and the metal nanowire layer is electrically connected to the periphery circuit.

Direct patterning method for a touch panel and touch panel thereof

A touch panel includes a substrate, a photosensitive layer, a metal nanowire layer and a photosensitive conductive layer. The metal nanowire layer and the photosensitive layer are formed on a display area and a peripheral area of the substrate. The photosensitive conductive layer is formed on the metal nanowire layer on the peripheral area. A removal region and a reserved region of both the photosensitive conductive layer and the photosensitive layer are defined by an exposure process. At the display area, the photosensitive layer and the metal nanowire layer in the removal region are removed by a developer to form a touch sensing electrode. At the peripheral area, the photosensitive conductive layer, the photosensitive layer and the metal nanowire layer in the removal region are removed by a developer to form a peripheral conductive trace. The touch sensing electrode is electrically connected to the peripheral conductive trace.

The direct patterning method includes: providing a substrate having a display area and a peripheral area, which a peripheral circuit having a bonding pad is disposed on the peripheral area; sequentially disposing a metal nanowire layer, a pre-cured film layer and a negative-type photosensitive layer thereon; performing a photolithography step; and curing the pre-cured film layer. The photolithography step includes exposing the negative-type photosensitive layer to define a removal region and a reserved region; and removing the negative-type photosensitive layer, the pre-cured film layer and the metal nanowire layer in the removal region by using a developer, such that a touch sensing electrode is fabricated in the display area and the bonding pad is exposed.

Touch panel and direct patterning method thereof

Growing community of inventors

Taipei, Taiwan

Shan-Yu Wu