University of Illinois

Shailendra Srivastava

Lynford L Goddard

Gang Logan Liu

Xin Yu

Chris Edwards

Terry Koker

Kaiyuan Wang

Lonna Edwards

Julianne Lee

Catherine Britt Carlson

Samuel Washington

Methods and apparatus for subtractively fabricating three-dimensional structures relative to a surface of a substrate and for additively depositing metal and dopant atoms onto the surface and for diffusing them into the bulk. A chemical solution is applied to the surface of the semiconductor substrate, and a spatial pattern of electron-hole pairs is generated by projecting a spatial pattern of illumination characterized by a specified intensity, wavelength and duration at each pixel of a plurality of pixels on the surface. Charge carriers are driven away from the surface of the semiconductor on a timescale short compared to the carrier recombination lifetime. Such methods are applied to creating a spatially varying doping profile in the semiconductor substrate, a photonic integrated circuit and an integrated photonic microfluidic circuit.

Spectrally and temporally engineered processing using photoelectrochemistry

Growing community of inventors

Urbana, IL, United States of America

Shailendra Srivastava