University of California

The Regents of the Unverslty of California

Shadi A Dayeh

Ren Liu

Atsunori Tanaka

Renjie Chen

Yu-Hwa Lo

Cesare Soci

Deli Wang

Arthur Yasheng Zhang

Lingquan Wang

David Aplin

Sang Heon Lee

Xin Yu Bao

Yun Goo Ro

James F Buckwalter

Yoontae Hwang

Woojin A Choi

Siarhei Vishniakou

Mehran Ganji

Namseok Park

Ahmed Youssef

Youngbin Tchoe

Cooper Levy

Farid Azzazy

A nanowire electrode array has a plurality of vertical nanowires extending from a substrate, each of the nanowires including a core of unitary first dielectric material that also covers the substrate and is unitary with the substrate. Each core has a sharp sub-100 nm diameter tip and a wider base, electrode leads on sidewalls to the tip of the nanowire, and second dielectric covering the electrode leads. The tips in the array can penetrate individual cells in cell culture, such as a mini-brain culture. The substrate can include a window for simultaneous optical imaging and electrophysiological recording.

Sharp, vertically aligned nanowire electrode arrays, high-yield fabrication and intracellular recording

A method for fabricating a Pt nanorod electrode array sensor device includes forming planar metal electrodes on a flexible film, co-depositing Pt alloy on the planar metal electrodes via physical vapor deposition, and dealloying the Pt alloy to etch Pt nanorods from the deposited Pt alloy. A Pt nanorod electrode sensor device includes a plurality of porous Pt nanorods on a planar metal electrode forming a sensor electrode. The planar metal electrode is on a flexible substrate. An electrode lead on the flexible substrate extends away from the planar metal electrode. Insulation is around porous Pt nanorods an upon the electrode lead.

Porous platinum nanorod electrode array flexible sensor devices and fabrication

A nanowire probe sensor array including a substrate with a metal pattern thereon. An array of semiconductor vertical nanowire probes extends away from the substrate, and at least some of probes, and preferably all, are individually electrically addressed through the metal pattern. The metal pattern is insulated with dielectric, and base and stem portions of the nanowires are also preferably insulated. A fabrication process patterns metal connections on a substrate. A semiconductor substrate is bonded to the metal pattern. The semiconductor substrate is etched to form the neural nanowire probes that are bonded to the metal pattern. Dielectric is then deposited to insulate the metal pattern.

Addressable vertical nanowire probe arrays and fabrication methods

Devices and methods of the invention use a plurality of Fin structures and or combine a planar portion with Fin structures to compensate for the first derivative of transconductance, gm. In preferred methods and devices, Fins have a plurality of widths and are selected to lead to the separate turn-on voltage thresholds for the largest, intermediate and smallest widths of the MIS HEMT fins flatten the transconductance gm curve over an operational range of gate source voltage.

Intrinsically tunable and ultra-linear multi-fin MIS-HEMT devices

Methods and devices that monolithically integrate thin film elements/devices, e.g., environmental sensors, batteries and biosensors, with high performance integrated circuits, i.e., integrated circuits formed in a high quality device layer. Preferred embodiments further monolithically integrate a solar cell array. Preferred embodiments provide pin-size and integrated solar powered wearable electronic, ionic, molecular, radiation, etc. sensors and circuits.

Monolithic thin film elements and performance electronics, solar powered systems and fabrication

A preferred conformal penetrating multi electrode array includes a plastic substrate that is flexible enough to conform to cortical tissue. A plurality of penetrating semiconductor micro electrodes extend away from a surface of the flexible substrate and are stiff enough to penetrate cortical tissue. Electrode lines are encapsulated at least partially within the flexible substrate and electrically connected to the plurality of penetrating semiconductor microelectrodes. The penetrating semiconductor electrodes preferably include pointed metal tips. A preferred method of fabrication permits forming stiff penetrating electrodes on a substrate that is very flexible, and providing electrical connection to electrode lines within the substrate.

Method for forming a multielectrode conformal penetrating array

A method for integrating III-V semiconductor materials onto a rigid host substrate deposits a thin layer of reactive metal film on the rigid host substrate. The layer can also include a separation layer of unreactive metal or dielectric, and can be patterned. The unreactive metal pattern can create self-aligned device contacts after bonding is completed. The III-V semiconductor material is brought into contact with the thin layer of reactive metal. Bonding is by a low temperature heat treatment under a compressive pressure. The reactive metal and the functional semiconductor material are selected to undergo solid state reaction and form a stable alloy under the low temperature heat treatment without degrading the III-V material. A semiconductor device of the invention includes a functional III-V layer bonded to a rigid substrate via an alloy of a component of the functional III-V layer and a metal that bonds to the rigid substrate.

Solid-state wafer bonding of functional materials on substrates and self-aligned contacts

A 1D nanowire photodetector device includes a nanowire that is individually contacted by electrodes for applying a longitudinal electric field which drives the photocurrent. An intrinsic radial electric field to inhibits photo-carrier recombination, thus enhancing the photocurrent response. Circuits of 1D nanowire photodetectors include groups of photodetectors addressed by their individual 1D nanowire electrode contacts. Placement of 1D nanostructures is accomplished with registration onto a substrate. A substrate is patterned with a material, e.g., photoresist, and trenches are formed in the patterning material at predetermined locations for the placement of 1D nanostructures. The 1D nanostructures are aligned in a liquid suspension, and then transferred into the trenches from the liquid suspension. Removal of the patterning material places the 1D nanostructures in predetermined, registered positions on the substrate.

Nanowire photodetector and image sensor with internal gain

A 1D nanowire photodetector device includes a nanowire that is individually contacted by electrodes for applying a longitudinal electric field which drives the photocurrent. An intrinsic radial electric field to inhibits photo-carrier recombination, thus enhancing the photocurrent response. Circuits of 1D nanowire include groups of photodetectors addressed by their individual 1D nanowire electrode contacts. Placement of 1D nanostructures is accomplished with registration onto a substrate. A substrate is patterned with a material, e.g., photoresist, and trenches are formed in the patterning material at predetermined locations for the placement of 1D nanostructures. The 1D nanostructures are aligned in a liquid suspension, and then transferred into the trenches from the liquid suspension. Removal of the patterning material places the 1D nanostructures in predetermined, registered positions on the substrate.

Growing community of inventors

San Diego, CA, United States of America

Shadi A Dayeh