Corning Incorporated

Sezhian Annamalai

Kenneth Edward Hrdina

Carlos Alberto Duran

William Rogers Rosch

Steven Bruce Dawes

Lisa Anne Moore

Xinghua Li

Jesse Kohl

Bryan Ray Wheaton

John Edward Maxon

William R Iv Angell

Annealing treatments for modified titania-silica glasses and the glasses produced by the annealing treatments. The annealing treatments include an isothermal hold that facilitates equalization of non-uniformities in fictive temperature caused by non-uniformities in modifier concentration in the glasses. The annealing treatments may also include heating the glass to a higher temperature following the isothermal hold and holding the glass at that temperature for several hours. Glasses produced by the annealing treatments exhibit high spatial uniformity of CTE, CTE slope, and fictive temperature, including in the presence of a spatially non-uniform concentration of modifier.

Ultralow expansion titania-silica glass

A method of forming a glass article is provided. The method includes the steps of positioning a first interface surface of a first glass block proximate a second interface surface of a second glass block to define an interface seam, welding the first and second glass blocks together around a majority of the interface seam to define an internal cavity, coupling a vacuum fitting to at least one of the first and second glass blocks, drawing a vacuum in the cavity between the first and second glass blocks, and heating the first and second glass blocks to fuse the first and second glass blocks together.

Fusing glass articles

Near-infrared shielding includes a glass material. The shielding provides transmittance at wavelengths between 390 to 700 nm, but near infrared absorbing species are distributed throughout the glass material and the shielding blocks light in the near infrared range. Further, the glass material has a near zero or negative coefficient of thermal expansion, allowing the glass material to heat up when the shielding is blocking a near infrared laser, without expanding much.

Near infrared shielding and laser-resistant window

A glass composite for use in Extreme Ultra-Violet Lithography (EUVL) is provided. The glass composite includes a first silica-titania glass section. The glass composite further includes a second doped silica-titania glass section mechanically bonded to a surface of the first silica-titania glass section, wherein the second doped silica-titania glass section has a thickness of greater than about 1.0 inch.

Glass composite for use in extreme ultra violet lithography

A method of forming a doped silica-titania glass is provided. The method includes blending batch materials comprising silica, titania, and at least one dopant. The method also includes heating the batch materials to form a glass melt. The method further includes consolidating the glass melt to form a glass article, and annealing the glass article.

Doped silica-titania glass having low expansivity and methods of making the same

A doped silica-titania ('DST') glass article that includes a glass article having a glass composition comprising a silica-titania base glass containing titania at 7 to 14 wt. % and a balance of silica, and a dopant selected from the group consisting of (a) F at 0.7 to 1.5 wt. %, (b) BOat 1.5 to 5 wt. %, (c) OH at 1000 to 3000 ppm, and (d) BOat 0.5 to 2.5 wt. % and OH at 100 to 1400 ppm. The glass article has an expansivity slope of less than about 1.3 ppb/Kat 20&#xb0; C. For DST glass articles doped with F or BO, the OH level can be held to less than 10 ppm, or less than 100 ppm, respectively. In many aspects, the DST glass articles are substantially free of titania in crystalline form.

Doped ultra-low expansion glass and methods for annealing the same

A doped silica-titania glass article is provided that includes a glass article having a glass composition comprising (i) a silica-titania base glass, (ii) a fluorine dopant, and (iii) a second dopant. The fluorine dopant has a concentration of fluorine of up to 5 wt. % and the second dopant comprises one or more oxides selected from the group consisting of Al, Nb, Ta, B, Na, K, Mg, Ca and Li oxides at a total oxide concentration from 50 ppm to 6 wt. %. Further, the glass article has an expansivity slope of less than 0.5 ppb/Kat 20&#xb0; C. The second dopant can be optional. The composition of the glass article may also contain an OH concentration of less than 100 ppm.

Doped ultra-low expansion glass and methods for making the same

Ultralow expansion titania-silica glass. The glass has high hydroxyl content and optionally include one or more dopants. Representative optional dopants include boron, alkali elements, alkaline earth elements or metals such as Nb, Ta, Al, Mn, Sn Cu and Sn. The glass is prepared by a process that includes steam consolidation to increase the hydroxyl content. The high hydroxyl content or combination of dopant(s) and high hydroxyl content lowers the fictive temperature of the glass to provide a glass having a very low coefficient of thermal expansion (CTE), low fictive temperature (T), and low expansivity slope.

[object Object]

A boron-doped titania-silica glass containing 0.1 wt % to 8.0 wt % boron, 9.0 wt % to 16.0 wt % TiO, and 76.0 wt % to 90.9 wt % SiO. The glass may further include F, Nb, Ta, Al, Li, Na, K, Ca, and Mg, individually or in combinations of two or more, at levels up to 4 wt %. The glass may have an OH concentration of more than 10 ppm. The glass features a CTE slope at 20&#xb0; C. of less than 1 ppb/K. The fictive temperature of the glass is less than 825&#xb0; C. and the peak CTE of the glass is less than 30 ppb/K. The glass has two crossover temperatures and a wide temperature interval over which CTE is close to zero. The uniformity of each crossover temperature relative to its average over a volume of at least 50 cmis within &#xb1;5&#xb0; C.

Boron-doped titania-silica glass having very low CTE slope

A glass article for use in Extreme Ultra-Violet Lithography (EUVL) is provided. The glass article includes a silica-titania glass having a compositional gradient through the glass article, the compositional gradient being defined by the functions:[TiO]=(()), and[SiO]=(100&#x2212;{()}&#x2212;&#x3b4;())wherein [TiO] is the concentration of titania in wt. %, [SiO] is the concentration of silica in wt. %, c is the titania concentration in wt. % for a predetermined zero crossover temperature (T), f(x, y, z) is a function in three-dimensional space that defines the difference in average composition of a volume element centered at the coordinates (x, y, z) with respect to c, and &#x3b4;(x, y, z) is a function in three-dimensional space that defines the sum of all other components of a volume element centered at the coordinates (x, y, z).

In one aspect the disclosure is directed to a binary silica-titania blank having a CTE of 0&#xb1;30 ppb/&#xb0; C. or less and a insert made of silica-titania-dopant(s) glass in the critical zone, wherein the dopants are selected from the group consisting of aluminum oxide, selected transition metal oxides, and amount of the dopants is in the range of 0.05 wt. % to 8 wt. % and the insert is fusion bonded to the blank with or without a frit. In various embodiments the dopants are selected from the group consisting of 0.25 wt. % to 8 wt. % AlO, 0.05 wt. % to 3 wt. % NbO, and 0.25 wt. % to 6 wt. % TaO.

Binary silica-titania glass articles having a ternary doped silica-titania critical zone

This disclosure is directed to a silica-titania-niobia glass and to a method for making the glass. The composition of the silica-titania-niobia (SiO&#x2014;TiO&#x2014;NbO) glass, determined as the oxides, is NbOin an amount in the range of 0.005 wt. % to 1.2 wt. %, TiOin an amount in the range of 5 wt. % to 10 wt. %, and the remainder of glass is SiO. In the method, the STN glass precursor is consolidated into a glass by heating to a temperature of 1600&#xb0; C. to 1700&#xb0; C. in flowing helium for 6 hours to 10 hours. When this temperature is reached, the helium flow can be replaced by argon for the remainder of the time. Subsequently the glass is cooled to approximately 1050&#xb0; C., and then from 1050&#xb0; C. to 700&#xb0; C. followed by turning off the furnace and cooling the glass to room temperature at the natural cooling rate of the furnace.

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Painted Post, NY, United States of America

Sezhian Annamalai