Carl Zeiss Smt Gmbh

Severin Waldis

Florian Bach

Armin Werber

Daniel Benz

Berndt Warm

Benedikt Knauf

Roger Marc Bostock

Sebastian Lani

Jian Deng

Markus Hauf

Yim-Bun Patrick Kwan

Sascha Bleidistel

Ralf Scharnweber

Wilfried Noell

Marco Jassmann

Caglar Ataman

Toralf Gruner

Markus Deguenther

Johannes Wangler

Damian Fiolka

Udo Dinger

Martin Endres

Dirk Heinrich Ehm

Ingo Saenger

Joachim Hartjes

Thomas Korb

Andras G Major

Olaf Dittmann

Ralf Stuetzle

Jens Ossmann

Dieter Kraus

Gundula Weiss

Stefan Wiesner

Christian Kempter

Matthias Orth

Marc Kirch

Martin Vogt

Yves Petremend

Lothar Kulzer

Christian Steigerwald

Matthias Hartmann

An optical component comprises a mirror array having a multiplicity of mirror elements, which are each connected to at least one actuator for displacement, a multiplicity of signal lines for the signal-transmitting connection of the actuators to an external, global control/regulating device for predefining an absolute position of the individual mirror elements, and a multiplicity of local regulating devices for regulating the positioning of the mirror elements, wherein the regulating devices are in each case completely integrated into the component.

Optical component

An optical system for a microlithographic projection exposure apparatus and a microlithographic exposure method are disclosed. In an embodiment an optical system for a microlithographic projection exposure apparatus includes at least one mirror arrangement having a plurality of mirror elements which are displaceable independently of each other for altering an angular distribution of the light reflected by the mirror arrangement. The optical system also includes at least one manipulator downstream of the mirror arrangement in the light propagation direction. The manipulator has a raster arrangement of manipulator elements so that light incident on the manipulator during operation of the optical system is influenced differently in its polarization state and/or in its intensity in dependence on the incidence location.

Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method

An optical component comprising a mirror array having a multiplicity of mirror elements, which each have at least one degree of freedom of displacement, and which are each connected to at least one actuator for displacement, has a multiplicity of local regulating devices for damping oscillations of the mirror elements, wherein each of the regulating devices in each case has at least one capacitive sensor having at least one moveable electrode and at least one electrode arranged rigidly relative to the carrying structure.

A mirror array having a total surface extending perpendicularly to a surface normal, comprises a multiplicity of mirror elements each having a reflection surface and at least one degree of freedom of displacement, wherein the totality of the mirror elements form a parqueting of a total reflection surface of the mirror array, and wherein the mirror array is embodied modularly as a tile element in such a way that the parqueting of the total reflection surface can be extended by a tiling of a plurality of such mirror arrays.

Mirror array

A microlithographic projection exposure apparatus has a mirror array having a base body and a plurality of mirror units. Each mirror unit includes a mirror and a solid-state articulation, which has at least one articulation part that connects the mirror to the base body. A control device makes it possible to modify the alignment of the respective mirror relative to the base body. Mutually opposing surfaces of the mirror and of the base body, or of a mirror support body connected to it, are designed as corresponding glide surfaces of a sliding bearing.

Microlithographic projection exposure apparatus

An illumination system of a microlithographic projection exposure apparatus includes a primary light source, a system pupil surface and a mirror array. The mirror array is arranged between the primary light source and the system pupil surface. The mirror array includes a plurality of adaptive mirror elements. Each mirror element includes a mirror support and a reflective coating. Each mirror element is configured to direct light produced by the primary light source towards the system pupil surface. The mirror elements can be tiltably mounted with respect to a support structure. The mirror elements include structures having a different coefficient of thermal expansion and being fixedly attached to one another. A temperature control device is configured to variably modify the temperature distribution within the structures to change the shape of the mirror elements.

Illumination system of a microlithographic projection exposure apparatus having a temperature control device

An illumination system of a microlithographic projection exposure apparatus comprises a light modulator which includes a modulator substrate and an array of mirrors that are supported by the modulator substrate. At least some adjacent mirrors partly overlap. The light modulator further comprises a plurality of actuators that are supported by the modulator substrate and are configured to tilt the mirrors individually.

Light modulator and illumination system of a microlithographic projection exposure apparatus

An optical module includes a chamber capable of being evacuated and a mirror in the chamber. The mirror includes a plurality of individual mirrors. Each individual mirror includes: a mirror body including a reflection face; a support structure; and a thermally conductive portion that mechanically connects the support structure to the mirror body. For at least one individual mirror, the thermally conductive portion includes a plurality of thermally conductive strips arranged radially, adjacent thermally conductive strips being separated from each other, and each of the plurality of thermally conductive strips connecting the mirror body to the support structure. For at least one individual mirror, an actuator is associated with the mirror body, the actuator being configured to displace the mirror body relative to the support structure in at least one degree of freedom.

Optical module for guiding a radiation beam

A mirror serves for guiding a radiation bundle. The mirror has a basic body and a coating of a reflective surface of the basic body, the coating increasing the reflectivity of the mirror. A heat dissipating device serves for dissipating heat deposited in the coating. The heat dissipating device has at least one Peltier element. The coating is applied directly on the Peltier element. A temperature setting apparatus has at least one temperature sensor for a temperature of the reflective surface. A regulating device of the Temperature setting apparatus can be connected to the at least one Peltier element and is signal-connected to the at least one temperature sensor. The result is a mirror in which a heat dissipating capacity of the heat dissipating device is improved.

Mirror for guiding a radiation bundle

Illumination optics for EUV microlithography guide an illumination light bundle from a radiation source to an object field with an extension ratio between a longer field dimension and a shorter field dimension, where the ratio is considerably greater than 1.

Illumination optics for EUV microlithography and related system and apparatus

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Bern, Switzerland

Severin Waldis