Samsung Electronics Co., Ltd.

Seungki Chae

Chang-hoon Oh

HunJung Yi

Jae-Won Hahn

An optical apparatus for plasma includes a light collection lens provided to receive optical emission spectrum from plasma, a first aperture stop disposed between the light collection lens and the plasma to block out-focused light, a second aperture stop disposed between the light collection lens and an imaging area of the light collection lens to block in-focused light, and a pinhole disposed at the imaging area of the light collection lens to limit depth of focus.

Growing community of inventors

Seoul, South Korea

Seungki Chae