Boe Technology Group Co., Ltd.

Beijing Boe Optoelectronics Technology Co., Ltd.

Hefei Boe Display Technology Co., Ltd.

Beijing Boe Optoelectronics Co., Ltd.

Seungjin Choi

Youngsuk Song

Seongyeol Yoo

Heecheol Kim

Feng Zhang

Guanbao Hui

Fangzhen Zhang

Jing Niu

Shuang Sun

Weifeng Zhou

Zhanfeng Cao

Jing Lv

Zhijun Lv

Jianshe Xue

Youngjin Song

Jaehong Kim

Guanboa Hui

The present disclosure provides an array substrate, a method for manufacturing the array substrate and a display device, and belongs to the field of display technology. The array substrate of the present disclosure includes: a base substrate; a light-blocking layer disposed on the base substrate; a thin film transistor disposed on the light-blocking layer; an organic light-emitting diode which is disposed on the light-blocking layer and has a first electrode coupled to a drain electrode of the thin film transistor; the light-blocking layer is provided with a plurality of scattering particles, and orthographic projections of at least a portion of the scattering particles on the base substrate are overlapped with an orthographic projection of the organic light-emitting diode on the base substrate, so as to scatter light emitted from the organic light-emitting diode.

Array substrate and display device with light blocking layer including scattering particles

An array substrate and a manufacturing method thereof, and a display device. The array substrate includes: a base substrate, including a first surface and a second surface opposite to each other, and a through-hole penetrating the base substrate from the first surface to the second surface; a data line on the first surface of the base substrate, the data line being at least partially filled in the through-hole; a thin film transistor on the second surface of the base substrate, the thin film transistor including a source electrode and a drain electrode, and the source electrode being electrically connected to the data line.

Array substrate and manufacturing method thereof, and display device

Disclosed is an array substrate and a display device. The array substrate includes: a plurality of gate lines and a plurality of data lines formed on a base substrate, and a plurality of pixel units defined by the plurality of gate lines and the plurality of data lines intersecting each other, wherein each pixel unit includes a thin film transistor and a pixel electrode connected with the thin film transistor, the pixel electrode, the data line, as well as an active layer, a source and a drain of the thin film transistor are disposed in a same layer and are formed through a single patterning process.

Array substrate and display device

A method for manufacturing the array substrate includes: forming a gate metal layer on a base by a first patterning process and forming a gate insulating layer on the gate metal layer; forming a semiconductor layer and a source/drain metal layer by a second patterning process on the resulted base, the source/drain metal layer including a data line and a metal electrode connected to the data line; forming a first electrode on the resulted base and forming a channel region by a third patterning process, the channel region causing the metal electrode to form a source electrode and a drain electrode; forming a passivation layer and an organic insulating layer by a fourth patterning process on the resulted base; the organic insulating layer at least corresponding to the data line; and forming a second electrode by a fifth patterning process on the resulted base.

Array substrate, manufacturing method thereof, display panel and manufacturing method thereof

The present application discloses an array substrate having a display area and a peripheral area. The array substrate includes a plurality of first thin film transistors respectively in a plurality of subpixels in the display area; and a plurality of second thin film transistors in the peripheral area, an oxygen content in active layers of the plurality of first thin film transistors being higher than that in active layers of the plurality of second thin film transistors.

Array substrate and fabricating method thereof

An array substrate, a method for fabricating the same and a display device are disclosed. The array substrate includes: a gate electrode of a TFT and a gate insulation layer sequentially formed on a base substrate; a semiconductor active layer, an etch stop layer and a source electrode and a drain electrode of the TFT sequentially formed on a part of the gate insulation layer that corresponds to the gate electrode of the TFT, the source and drain electrodes of the TFT are respectively in contact with the semiconductor active layer by way of via holes. The array substrate further includes: a first insulation layer formed between the gate electrode of the TFT and the gate insulation layer and the gate electrode is in contact with the gate insulation layer at a channel region of the TFT between the source electrode and the drain electrode of the TFT.

Array substrate, method for fabricating the same and display device

The embodiments of the invention disclose an array substrate, a manufacturing method thereof and a display device. Due to the fact that the surfaces of a source electrode, a drain electrode and a data line which are arranged on the same layer are provided with an oxide film which is formed after annealing treatment is conducted on the source electrode, the drain electrode and the data line, in the process that the pattern of a pixel electrode is formed on the source electrode, the drain electrode and the data line by the adoption of a composition technology, the oxide film can protect the source electrode and the data line under the oxide film from being corroded by an etching agent when the pattern of the pixel electrode is formed by etching, and the display quality of a display panel will not be affected.

Array substrate having partially oxidized source electrode, drain electrode and data line

Provided are a thin film transistor and manufacturing method thereof, array substrate and manufacturing method thereof, and display device. The thin film transistor comprises: an active layer, an etch stop layer disposed on the active layer, an overcoating layer disposed on the etch stop layer, and a source electrode and a drain electrode disposed on the overcoating layer, wherein the overcoating layer comprises at least one of a conductive material layer, a non-transparent insulation layer and a non-transparent semiconductor layer, and the source electrode and the drain electrode are electrically connected with the active layer.

Thin film transistor and manufacturing method thereof, array substrate and manufacturing method thereof, and display device

Provided is a thin film transistor, which comprises a gate electrode; a source electrode; and a drain electrode, wherein at least one electrode of the gate electrode, the source electrode and the drain electrode has a plurality of first grooves formed on an upper surface thereof. An array substrate, a display panel and a manufacturing method of an array substrate are also provided. In manufacturing the thin film transistor, the pattern is accurate and the yield is high.

Thin film transistor, array substrate and manufacturing method thereof, and display panel

The invention relates to a method for fabricating an array substrate, an array substrate and a display device. The method for fabricating an array substrate may comprise: forming a pattern including a source electrode, a drain electrode and a data line; forming a non-crystalline semiconductor thin film layer; and performing annealing, so as to convert only the non-crystalline semiconductor thin film layer on the source electrode, drain electrode and data line to a metal semiconductor compound. By converting only the non-crystalline semiconductor thin film layer on the source electrode, drain electrode and data line into a metal semiconductor compound, the resulting metal semiconductor compound may prevent oxidative-corrosion of the metal thin film layer, such as a low-resistance metal (e.g., Cu or Ti) layer, in the subsequent procedures, which is favorable for the fabrication of a metal oxide thin film transistor using Cu or Ti.

Method for fabricating array substrate, array substrate and display device

A touch panel, a manufacturing method thereof and a display device are provided. The touch panel includes a first touch electrode, a second touch electrode and a one-piece insulating element. The second touch electrode includes an electrode section disposed in a same layer as the first touch electrode and a connecting section under the electrode section. The electrode section includes a first electrode section and a second electrode section, which are electrically connected by the connecting section, and the connecting section is spaced apart from the first touch electrode. The insulating element includes a first insulating section between the connecting section and the first touch electrode and a second insulating section between the first electrode section and the first touch electrode and also between the second electrode section and the first touch electrode. The insulating sections can be obtained by performing a patterning process, so that the manufacturing method of the touch panel is simplified.

Touch panel, manufacturing method thereof, and display device

The present invention provides an open head mount display device and a display method thereof, relates to the field of head mount display technology, and can solve technical problems (such as a tedious operation, a poor display effect, an inaccurate position of the display image or the like) of the open head mount display device in the prior art. The open head mount display device of the present invention comprises: a display unit for providing a display image to user's eyes; an image acquisition unit for acquiring an image of an external object; an image analysis unit for analyzing and determining a position of the external object relative to the user's eyes in accordance with the image acquired by the image acquisition unit; and an image adjusting unit for adjusting the display image in accordance with an analysis result of the image analysis unit.

Open head mount display device and display method thereof

The present invention provides an array substrate and a manufacturing method thereof, a display panel and a display device, belongs to a field of black-matrix-less display technology, and can solve problems that a conductive reflecting structure in a display panel of prior art affects display effect and external visibility. The array substrate of the present invention comprises a conductive reflecting structure and metal particles provided above the conductive reflecting structure.

Array substrate and manufacturing method thereof, display panel, display device

An array substrate and manufacturing method thereof, display panel and display device. The manufacturing method of the array substrate includes: forming, on a substrate, a first conductive pattern, a second conductive pattern and an insulating pattern, the insulating pattern at least covering an upper surface of the first conducting pattern, the first conductive pattern including a first amorphous transparent conductive pattern and a first metal pattern, and the second conductive pattern including a second amorphous transparent conductive pattern; and performing an annealing treatment to convert the first amorphous transparent conductive pattern and the second amorphous transparent conductive pattern to a first crystalline transparent conductive pattern and a second crystalline transparent conductive pattern respectively. The method addresses the problem in which a metal surface is readily oxidizable when performing an annealing treatment, thereby improving the product yield.

Array substrate and manufacturing method thereof, display panel and display device

An array substrate, a manufacturing method thereof and a display device are provided. The array substrate comprises a base substrate (), an organic light-emitting diode (OLED) device and a thin-film transistor (TFT) structure, the OLED device disposed on one side of the base substrate (); the TFT structure disposed on the other side of the base substrate (); a through hole formed on the base substrate and provided with a conductive bridge (); and the OLED device connected with the TFT structure through the conductive bridge (). The array substrate can avoid electrical interference of the TFT structure on the OLED device, and hence accurate drive for the OLED device can be achieved; as the OLED device can be directly formed on a surface of the base substrate, surface treatment of a pixel electrode is saved with respect to conventional OLED display device, and hence manufacturing process can be accelerated and manufacturing cost can be reduced; and as both an anode and a cathode of the OLED device are made from transparent materials, double-sided light emission can be achieved in the array substrate, and hence double-sided display can be achieved in the array substrate.

Growing community of inventors

Beijing, China

Seungjin Choi