Samsung Electronics Co., Ltd.

Seungbu Baek

Seohyun Kim

Yongmyung Jun

Hyunchul Kim

Sangwoo Kim

Youngchan Kim

Hyunjin Ko

Ohchel Kwon

Hyunwoo Nho

Jaeseong Ryu

Daewoong Choi

Jae Seong Ryu

Inkwang Bae

Hyeongkwon Jeong

A supercritical fluid processing apparatus including a supercritical fluid supply module including a gas liquefier to liquefy a gas transferred from a gas supply and provide a liquefied fluid, a storage tank to change the liquefied fluid to a supercritical state and store a supercritical fluid, and an internal pipe connecting the gas liquefier to the storage tank; an exhaust fluid supply module including an exhaust fluid liquefier including a regeneration storage tank to collect a first exhaust fluid from the storage tank, and a refrigerant pipe to liquefy the first exhaust fluid in the regeneration storage tank and maintain the liquefied first exhaust fluid at a predetermined temperature/pressure; a first exhaust pipe to transfer the first exhaust fluid from the storage tank to the exhaust fluid liquefier; and a resupply pipe to resupply the first exhaust fluid collected and liquefied in the exhaust fluid liquefier to the storage tank.

Supercritical fluid processing apparatus and substrate processing system including the same

A substrate processing chamber includes a housing providing a process space; a spin apparatus provided in the housing; and a fluid spraying nozzle configured to spray fluid into the process space, wherein the spin apparatus includes: a spin chuck configured to support a substrate; a rotation driving part configured to rotate the spin chuck; and a weight sensor configured to measure a weight of the substrate supported on the spin chuck.

Substrate processing chamber, substrate processing system including the same, and substrate processing method using the same

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Hwaseong-si, South Korea

Seungbu Baek