Snu Rdb Foundation

Seungah Lee

Sunghoon Kwon

Sangkwon Han

Jisung Jang

Sueun Chung

Wook Park

Sung Hoon Kwon

Su Eun Chung

A technique related with a lithography system is disclosed. The lithography system includes at least one target object disposed on a substrate, a processor configured to process an image of the target object to determine an optical pattern for a coating layer of the target object, and an exposure apparatus configured to provide light having the optical pattern determined by the processor to the substrate.

Image processing-based lithography system and method of coating target object

An optofluidic lithography system including a membrane, a microfluidic channel, and a pneumatic chamber is provided. The membrane may be positioned between a pneumatic chamber and a microfluidic channel. The microfluidic channel may have a height corresponding to a displacement of the membrane and have a fluid flowing therein, the fluid being cured by light irradiated from the bottom to form a microstructure. The pneumatic chamber may induce the displacement of the membrane depending on an internal atmospheric pressure thereof.

Optofluidic lithography system, method of manufacturing two-layered microfluid channel, and method of manufacturing three-dimensional microstructures

Growing community of inventors

Gyeonggi-do, South Korea

Seungah Lee