Cheil Industries Inc.

Seung-Wook Shin

Youn-Jin Cho

Yun-Jun Kim

Yoo-Jeong Choi

Hea-Jung Kim

Young-Min Kim

Sang-jun Choi

Hyun-Ji Song

Chung-Heon Lee

Yong-Woon Yoon

You-Jung Park

Joon-Young Moon

Seung-Hee Hong

Go-Un Kim

Yu-Shin Park

Yo-Choul Park

Hye-Won Kim

A monomer for a hardmask composition is represented by the following Chemical Formula 1, 

Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition

Disclosed are a monomer represented by the following Chemical Formula 1 for a hardmask composition, a hardmask composition including the monomer, and a method of forming patterns using the same. In the above Chemical Formula 1, A, A', L, L&#x2032;, X and n are the same as defined in the specification.

Monomer for hardmask composition, hardmask composition including said monomer, and method for forming pattern using said hardmask composition

A hardmask composition includes a monomer represented by the following Chemical Formula 1, a polymer including a moiety represented by the following Chemical Formula 2, a polymer including a moiety represented by the following Chemical Formula 3, or a combination thereof, and a solvent, 

Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns

A photosensitive polymer, the photosensitive polymer including repeating units represented by Formulae 1 to 3: wherein Rand Rare independently hydrogen or methyl, Ris a C4 to C20 acid-labile group, Ris a lactone-derived group, AR is a substituted or unsubstituted phenyl ring, or a substituted or unsubstituted aryl having from two to three fused aromatic rings, carbon Cis bonded directly to an aromatic ring of AR, l, m, and n are positive integers, l/(l+m+n) is about 0.1 to about 0.5, m/(l+m+n) is about 0.3 to about 0.5, and n/(l+m+n) is about 0.1 to 0.4.

Photosensitive polymer, resist composition, and associated methods

A (meth)acrylate compound having an aromatic acid-labile group, the (meth)acrylate compound being represented by the following Formula 1: In Formula I, Ris hydrogen or methyl, Ris hydrogen, a substituted or unsubstituted alkyl, or a substituted or unsubstituted aryl, Ris hydrogen, a substituted or unsubstituted alkyl, or a substituted or unsubstituted aryl, AR is a substituted or unsubstituted phenyl, or a substituted or unsubstituted aryl having from two to four fused aromatic rings, and carbon Cis bonded directly to an aromatic ring of AR.

(Meth)acrylate compound having aromatic acid labile group, photosensitive polymer, resist composition, and associated methods

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Uiwang-si, South Korea

Seung-Wook Shin