Samsung Display Co., Ltd.

Korea University Research and Business Foundation

Cj Cheiljedang Corporation

Sogang University Research Foundation

Samsung Electronics Co., Ltd.

Seung-Won Park

Dong-Hoon Lee

Taewoo Kim

Daehwan Jang

Lei Xie

Myung Im Kim

Min Hyuck Kang

Tae Woo Kim

Dae-Young Lee

Baek Hee Lee

Gugrae Jo

Moongyu Lee

Hyungbin Cho

Su Mi Lee

Minhyuck Kang

Bong-Jin Moon

Na Na Kang

Xie Lei

Jung-Hoon Kim

Hae Il Park

Nam Seok Roh

Eunjung Kim

Moon-Gyu Lee

Yunjong Yeo

Joona Bang

Byoung-Ho Cheong

Seong-bo Kim

Hyun Jung Jung

June Huh

Jin Yeong Lee

Sang Hoon Woo

Jongwoo Kim

Sang-Hoon Lee

Sanghoon Lee

Won-Sang Park

Jong Seo Lee

Won-ki Hong

Gug-Rae Jo

Wonjong Kim

Su-Mi Lee

Woosuk Jung

Dae-Hwan Jang

Moon Gyu Lee

Jung-Gun Nam

Bong-Yeon Kim

Kang-Pyo Lee

Yong-Hwan Ryu

Jaeheung Ha

Young-Chan Kim

Oleg Prudnikov

Min-Uk Kim

Tae-Woo Kim

Donghee Lee

Young-Mi Lee

Guk-Hyun Kim

Cheol-Kyu Kim

Changyeong Song

Min Jung Kang

Hyun-Deok Im

Su Hwan Lee

Hyun-jin Cho

Hyunju Kang

Moon Chui Lee

Baek-Hee Lee

Sumi Lee

Min-Hyuck Kang

Sang-hoon Song

Jae-Ho You

Jin-Ha Kim

Deok-Kun Oh

Sung-Young Choi

Hye-jung Kim

Taek-beom Kim

Jihun Kim

Yong-Joo Lee

Sang-Hoon Song

Incheol Jeong

Myung-Im Kim

Baehyoun Jung

Woon-hwa Lee

Dae-Ho Son

Joo-Hang Lee

Kang-Deug Lee

Seung-Bae Ji

Jun-Gap An

A stamp for nano imprinting includes a base substrate, a first pattern part and a second pattern part disposed on the base substrate and having different widths, and a third pattern part and a fourth pattern part having different widths. Each of the first pattern part to the fourth pattern part includes a plurality of nano patterns, and the first pattern part and the second pattern part and the third pattern part and the fourth pattern are disposed to be arranged adjacent to each other in a sequential order in the first direction.

Master stamp for nano imprint and method for manufacturing the same

A display panel includes a light emitting element and an encapsulation layer on the light emitting element. The encapsulation layer covers the light emitting element. The encapsulation layer includes a plurality of polymer layers including a block copolymer. The plurality of polymer layers includes a plurality of first polymer layers, each of which has a first refractive index, and a plurality of second polymer layers, each of which has a second refractive index greater than the first refractive index. A difference between the first refractive index and the second refractive index is in a range of about 0.1 to about 0.6.

Display panel and method of fabricating the same

A display device including a light source member including a plurality of light emitting units emitting a first color light, an optical member disposed on an upper side of the light source member, and a liquid crystal display panel disposed on an upper side of the optical member. The optical member includes a base substrate, a color conversion layer disposed on the base substrate and including a quantum dot for converting the first color light into a second color light and a third color light, a filter layer disposed between the base substrate and the color conversion layer and transmitting the first color light and reflecting the second color light and the third color light, and an optical path changing layer disposed on at least one of an upper surface and a lower surface of the filter layer.

Display device

A method of manufacturing a roll type imprint master mold including disposing a base layer on a substrate including a first area and a second area adjacent to the first area, disposing an inorganic insulation layer on the base layer, forming a first mask pattern and a first resin pattern in the first area, forming a pattern layer by etching the inorganic insulation layer using the first resin and the first mask patterns as a mask, removing the first resin and the first mask patterns, forming a second mask pattern and a second resin pattern in the second area, forming a pattern layer by etching the inorganic insulation layer using the second resin and the second mask patterns as a mask, removing the second resin and the second mask patterns, separating the base layer from the substrate, and attaching the base layer onto a roll body.

Roll type imprint master mold, method of manufacturing the same, and imprint method using the same

A wire grid polarizer includes a base substrate, a wire grid pattern, a first stitch line extending in a first direction, and a second stitch line extending in a second direction which crosses the first direction, and including a first portion and a second portion which are discontinuous from each other, in which the wire grid pattern is evenly formed on all of the base substrate except where the first and second stitch lines exist, and the first and second stitch lines are where the wire grid pattern is unevenly formed.

Imprint lithography method, master template for imprint, wire grid polarizer manufactured using the master template and display substrate having the same

A method of manufacturing an imprint master template including forming a first layer pattern only in a partial region and a second layer formed in the entire region, and then a back exposure process is performed.

Method of manufacturing imprint master template

A liquid crystal display according to an exemplary embodiment of the present invention includes: a display panel, and a color conversion layer coupled to the display panel and having a color conversion layer, where the color conversion layer includes a block copolymer including a first copolymer and a second copolymer, and quantum rods dispersed within the block copolymer. The block copolymer includes a first block structure unit formed by the first copolymer; and a second block structure unit formed by the second copolymer, where the quantum rods is are disposed within either one of the first block structure unit and the second block structure unit.

Liquid crystal display having improved color reproduction

An imprint lithography method includes forming a first imprint pattern on a substrate in a first area and a third area, wherein the third area is spaced apart from the first area, forming a first resist pattern on the substrate on a second area, wherein the second area is adjacent the first and third areas, forming a first pattern in the first and third areas by etching an element under the first imprint pattern using the first imprint pattern and the first resist pattern as an etch barrier, forming a second imprint pattern on the substrate in a second area, forming a second resist pattern on the substrate on the first area and the third area, and forming a second pattern in the second area by etching an element under the second imprint pattern using the second imprint pattern and the second resist pattern as an etch barrier.

An exemplary embodiment discloses an imprint lithography method including: forming a first imprint pattern on a base substrate in a first area; forming a first resist pattern on the base substrate in a second area, the second area partially overlapping the first area; etching a third area using the first imprint pattern and the first resist pattern as an etch barrier, wherein the third area is a portion of the first area that is not overlapped with the second area; removing the first imprint pattern and the first resist pattern; forming a second imprint pattern on the base substrate in a fourth area which overlaps the second area and partially overlaps the third area; forming a second resist pattern on the base substrate in the third area; and etching the second area using the second imprint pattern and the second resist pattern as an etch barrier.

Imprint lithography method, method for manufacturing master template using the method and master template manufactured by the method

A manufacturing method of a mother substrate assembly includes forming a metal layer on substantially an entire surface of a transparent substrate including a cell area including a non-display area and a display area, an align key area, and a substrate area surrounding the cell area and the align key area, etching the metal layer to form an align key in the align key area, etching the metal layer to form a reflection part in the non-display area, and etching the metal layer in the display area to form a metal nanowire in the display area.

Method of manufacturing mother substrate assembly

A block copolymer is provided. The block copolymer according to an exemplary embodiment includes a first block represented by Chemical Formula 1 and a second block represented by Chemical Formula 2: wherein COM1 and COM2 are independently selected from a polystyrene moiety, polymethylmethacrylate moiety, polyethylene oxide moiety, polyvinylpyridine moiety, polydimethylsiloxane moiety, polyferrocenyldimethylsilane moiety, and polyisoprene moiety, R1 is hydrogen or an alkyl group with 1 to 10 carbon atoms, Ph is a phenyl group, a is 1 to 50, R2 is hydrogen or an alkyl group with 1 to 10 carbon atoms, and b is 1 to 50.

Block copolymer, method of forming the same, and method of forming pattern

A display device includes a reflective polarizer plate including a first substrate defining an opening area and a non-opening area, and a wire grid polarizer which is disposed on a surface of the first substrate and includes a polarizing part including a plurality of nano wire patterns which is arranged in the opening area to be spaced apart from each other, and a reflecting part including a metal film provided in the non-opening area.

Manufacturing method of reflective polarizer plate and display device including the same

A block copolymer includes: a first block, and a second block copolymerized with the first block. The second block includes a silyl group including a ring-type functional group.

Block copolymer and pattern forming method using the same

Growing community of inventors

Seoul, South Korea

Seung-Won Park