Sk Enpulse Co., Ltd.

Seung Kyun Kim

Jang Won Seo

Jong Wook Yun

Eun Sun Joeng

Yong Ju Jeong

Provided is a polishing pad including a polishing layer, wherein the nuclear magnetic resonance (NMR)C spectrum of a processed composition prepared by adding 1 g of the polishing layer to a 0.3 M aqueous solution of potassium hydroxide (KOH) and allowing the mixture to react in a closed container at a temperature of 150° C. for 48 hours includes a first peak appearing at 15 ppm to 18 ppm, a second peak appearing at 9 ppm to 11 ppm, a third peak appearing at 138 ppm to 143 ppm, and a fourth peak appearing at 55 ppm to 65 ppm, and the softening control index calculated by Equation 1 is 0.10 to 0.45. The polishing pad includes the polishing layer having physical properties corresponding to the softening control index, and thus may exhibit a removal rate and defect prevention performance within desired ranges in polishing of a polishing target.

Growing community of inventors

Gyeonggi-do, South Korea

Seung Kyun Kim