Cebt Co., Ltd.

Industry-University Cooperation Foundation Sunmoon University

Seung Joon Ahn

Dae Wook Kim

Ho Seob Kim

Tae Sik Oh

Young Chul Kim

Ho Soeb Kim

Dae Wook 125-702 Park Town Samik Apt Kim

Disclosed herein is a microcolumn with a double aligner. The microcolumn is configured such that when an axis of an aperture of a limiting aperture is spaced apart from an original path of a particle beam, the path of the particle beam can be effectively compensated for in such a way that the path of the particle beam is aligned with the axis of the aperture of the limiting aperture by the double aligner. The microcolumn includes a source lens. The source lens includes at least two aligner layers which compensate for the path of the particle beam.

Micro-column with double aligner

The present invention relates to a method for improving focusing in an electron column that generates an electron beam. The method for controlling the focusing of an electron beam in according to the present invention reduces the spot size of the electron beam when the electron beam reaches a specimen, so that resolution can be increased and the line width of a pattern in a semiconductor lithography process can be reduced, with the result that the performance of the electron can be improved.

Method for focusing electron beam in electron column

The present invention provides a new extractor for a micro-column and an alignment method of the aperture of the extractor and an electron emitter for a micro-column. Further, the present invention provides a measuring system, a method for measuring, and an alignment method using the principle of the alignment.

Extractor for an microcolumn, an alignment method for an extractor aperture to an electron emitter, and a measuring method and an alignment method using thereof

Growing community of inventors

Chonan-si, South Korea

Seung Joon Ahn