Eugene Technology Co., Ltd.

Seung-Hyun Yoon

Jae-Ho Lee

Sung-Tae Je

Sang-Ho Choi

Provided is an apparatus for processing a substrate. The apparatus includes a chamber providing an inner space in which a process with respect to the substrate is performed, a susceptor disposed in the inner space and on which the substrate is placed, a fixing plate disposed in an exhaust port disposed in a sidewall of the chamber along a circumference of the susceptor, the fixing plate having a plurality of through-holes, and at least one sliding plate disposed on an upper or lower portion of the fixing plate to rotate with respect to a center of the susceptor, the at least one sliding plate selectively opening and closing the through-holes.

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Yongin-si, South Korea

Seung-Hyun Yoon