Samsung Electronics Co., Ltd.

Dongwoo Fine-chem Co., Ltd.

Dongwoo Fine-chem

Seung-Hyun Ahn

Sang-Mun Chon

Baik-soon Choi

Eun-Mi Bae

Kyoung-mi Kim

Jae-ho Kim

Kwang-sub Yoon

Sang-Kyu Park

Shi-Yong Yi

Dae-Joung Kim

Yeu-Young Youn

Shi-Jin Sung

Ahn-Ho Lee

Hoe-Sik Chung

Ok-Seok Jang

Mi-Sook Jeon

Sang-tae Kim

Yong-il Kim

Kyong-ho Lee

Sang-Tae Kim

Baik-Soon Choi

Jin-Seok Yang

Young-Cheul Lim

Kyong-Ho Lee

A thinner composition including an acetate-based compound in an amount in a range of about 30 weight percent to about 70 weight percent, a lactate-based compound in an amount in a range of about 1 weight percent to about 20 weight percent, a propionate-based compound in an amount in a range of about 30 weight percent to about 60 weight percent, and an ether-based additive in an amount in a range of about 10 ppm to about 500 ppm, based on a total amount of the composition.

Thinner compositions

In a thinner composition and a method of forming a photosensitive film, the thinner composition includes about 50 to about 90% by weight of propylene glycol monomethyl ether acetate, about 1 to about 20% by weight of propylene glycol monomethyl ether, about 1 to about 10% by weight of &#x3b3;-butyrolactone, and about 1 to about 20% by weight of n-butyl acetate. The thinner composition may have a proper volatility and an improved ability to dissolve various types of photosensitive materials, and thus the thinner composition may be usefully employed in an edge bead rinse process, a rework process or a pre-wetting process.

Methods of forming a photosensitive film

A thinner composition includes propylene glycol ether acetate, methyl 2-hydroxy-2-methyl propionate, and an ester compound such as ethyl lactate, ethyl 3-ethoxy propionate or a mixture thereof.

Thinner composition and method of removing photoresist using the same

A thinner composition is effective in removing a variety of photoresists, and includes propylene glycol mono-methyl ether acetate, ethyl 3-ethoxy propionate and at least one of &ggr;-butyro lactone and propylene glycol mono-methyl ether. The thinner composition can selectively strip a photoresist coated on a backside and at an edge portion of a substrate, as well as a photoresist coated on a whole front surface of the substrate.

Thinner composition and method of stripping a photoresist using the same

A photoresist stripper composition is made up of a mixture of an acetic acid ester, &ggr;-butyrolactone (GBL), and a non-acetate ester or a poly alkyl alcohol derivative. The acetic acid ester may be at least one of n-butyl acetate, amyl acetate, ethyl aceto-acetate, and isopropyl acetate. The non-acetate ester may be at least one of ethyl lactate (EL), ethyl-3-ethoxy propionate (EEP) and methyl-3-methoxy (MMP). The poly alkyl alcohol derivative may be at least one of propylene glycol monomethyl ester (PGME) and propylene glycol monomethyl ester acetate (PGMEA).

Photoresist stripper compositions

Growing community of inventors

Suwon-si, South Korea

Seung-Hyun Ahn