Samsung Electronics Co., Ltd.

Seung Hyuk Chang

Seok Lee

Myung-Sun Kim

Young Gu Jin

Hyun Seok Lee

Tae Yon Lee

Kwang-Min Lee

Yoon Dong Park

Ju Hwan Jung

Hyoung Soo Ko

Chil Hee Chung

Won Joo Kim

Doo Cheol Park

Jung Kyu Jung

A method of fabricating a microlens includes forming layer of photoresist on a substrate, patterning the layer of photoresist, and then reflowing the photoresist pattern. The layer of photoresist is formed by coating the substrate with liquid photoresist whose viscosity is 150 to 250 cp. A depth sensor includes a substrate and photoelectric conversion elements at an upper portion of the substrate, a metal wiring section disposed on the substrate, an array of the microlenses for focusing incident light as beams onto the photoelectric conversion elements and which beams avoid the wirings of the metal wiring section. The depths sensor also includes a layer presenting a flat upper surface on which the microlenses are formed. The layer may be a dedicated planarization layer or an IR filter, interposed between the microlenses and the metal wiring section.

Method of fabricating microlens, and depth sensor including microlens

An operation method of an image sensor includes determining a distance between the image sensor and an object, and activating at least one of a color pixel, a depth pixel and a thermal pixel included in a pixel array of the image sensor based on a determined distance and a reference distance.

Image sensor, operation method thereof and apparatuses including the same

Growing community of inventors

Seongmam-Si, South Korea

Seung Hyuk Chang