Samsung Display Co., Ltd.

Yonsei University

Seung Hwa Baek

Hyang-Shik Kong

Min Hyuck Kang

Jin Ho Ju

Bong-Yeon Kim

Kyoung Sik Kim

Hyun Joo Lee

Jeong Won Kim

Jun Hyuk Woo

Jong Kwang Lee

A photomask for exposure includes: a transparent substrate; a light blocking pattern layer positioned on the transparent substrate; a first dielectric layer positioned on the light blocking pattern layer and including a dielectric material; and a negative refractive index layer positioned on the first dielectric layer and including a metal. A surface plasmon quasi-bound mode of the photomask for exposure overlaps a wavelength range of the light source of the light exposer which irradiates light to the photomask for exposure.

Photomask for exposure and method of manufacturing pattern using the same

Provided are a photomask, including: a substrate; an opaque pattern formed on the substrate and made of a material which does not penetrate light; a first dielectric layer formed on the substrate and the opaque pattern; and a negative refractive-index meta material layer formed on the first dielectric layer, in which a dispersion mode used in the photomask uses a Quasi bound mode, a manufacturing method of the photomask, and a manufacturing method of a substrate using the photomask.

Mask for use in photolithography, manufacturing method thereof and manufacturing method of devices by using the mask

Growing community of inventors

Incheon, South Korea

Seung Hwa Baek