Toray Advanced Materials Korea Inc.

Seung Hun Han

Kil Joong Kim

Gi Jeong Moon

In Seek Chung

In a gas-barrier aluminum deposition film according to one embodiment of the present invention, a seed coating layer containing functional groups of at least one type selected from among a hydroxyl group (—OH), an amine group (—NH), and a carboxylic acid group (—COOH) is formed on a thermoplastic plastic base film to form a seed molecular layer that enables uniform deposition of aluminum, such as AlOx or AlNx, through chemical reaction, on a surface of the coating layer, with aluminum atoms vaporized at the initial stage of aluminum deposition, thereby inducing uniform deposition of an aluminum layer to be subsequently deposited. Therefore, it is possible to provide a deposited film having superior oxygen and water vapor barrier properties compared to existing aluminum deposition films.

Gas barrier aluminum deposition film and preparation method thereof

A biaxially oriented polyester reflection film according to an embodiment of the present invention includes: a core layer having a plurality of voids, and containing homo-polyester, copolymer polyester, a resin incompatible with polyester, and inorganic particles; and a skin layer formed at least one surface of the core layer, and containing homo-polyester, copolymer polyester, and inorganic particles, wherein the biaxially oriented polyester reflection film is formed to have a plurality of light focusing structures, each of which has a concave center portion, and which are arranged in a grid pattern.

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Gyeongsangbuk-do, South Korea

Seung Hun Han