Semes Co., Ltd.

Seung Han Lee

Jin Ho Choi

Ki Sang Eum

Byoung Doo Choi

Sun Wook Jung

Hyun Min Kim

Young Seo An

Si Eun Kim

Seung Hwan Lee

Jae Oh Bang

The inventive concept relates to a substrate treating apparatus including a process chamber having a first and a second body, a support unit supporting a substrate, a heating unit heats the substrate, a driver moves any one of the first body and the second body, an interval state detection unit that detects an interval state between a side wall of the first body and a side wall of the second body when the first and the second body are placed in a process location, and a controller that controls the driver and the interval state detection unit, wherein the interval state detection unit includes a pressure provision line that provides a positive pressure or a negative pressure between the side wall of the first body and the side wall of the second body, and a pressure measurement member that measures a change in a pressure of the pressure provision line.

Substrate treating apparatus and substrate treating method

An apparatus for treating a substrate, the apparatus comprising: a processing container having an inner space; a support unit having a support plate configured to support and rotate the substrate in the inner space; a liquid supply unit supplying treating liquid to the substrate supported by the support unit; and an exhaust unit exhausting an air flow in the inner space, wherein the processing container includes a bottom wall and a side wall extending from the outside end of the bottom wall, the processing container including a first gas-liquid separator provided at the side wall.

Apparatus for treating substrate

Growing community of inventors

Chungcheongnam-do, South Korea

Seung Han Lee