Samsung Display Co., Ltd.

Seung Ha Choi

Kap Soo Yoon

Seul Ki Kim

Woo Geun Lee

Hyun Sook Kim

Jae Hyun Lee

Seung Sok Son

Yun Seok Han

Su Jung Jung

Hyun Jung Kim

June Whan Choi

Jeong Uk Heo

Kwang Soo Lee

Jung Kyoung Cho

Hyun Woong Baek

Jong Bum Choi

A display device includes a first base portion, a first conductive layer comprising a lower light blocking layer on the first base portion, and a lower wiring spaced apart from the lower light blocking layer, a buffer layer disposed on the first conductive layer, a semiconductor layer disposed on the first buffer layer and comprising a first area, a second area on one side of the first area, and a third area on the other side of the first area, a gate insulating layer on the semiconductor layer, and a second conductive layer comprising a gate electrode overlapping the first area on the gate insulating layer, wherein conductivity of each of the first area and the second area is higher than conductivity of the first area, the third area is electrically connected to the lower wiring, and the second area is directly connected to the lower light blocking layer.

Display device and method of manufacturing the same

A display device and a method of fabricating the same, the display device including a light-blocking layer disposed on a substrate, a buffer layer disposed on the light-blocking layer, a semiconductor layer disposed on the buffer layer, a gate insulating layer disposed on the semiconductor layer, a connection pattern layer and a gate electrode disposed on the gate insulating layer and spaced apart from each other, an interlayer dielectric layer disposed on the connection pattern layer and the gate electrode, a via layer disposed on the interlayer dielectric layer, a first bridge layer and a second bridge layer disposed on the via layer, a pixel electrode disposed on the second bridge layer, and a light-emitting layer disposed on the pixel electrode. An end of the first bridge layer is connected to the light-blocking layer through the connection pattern layer, and another end thereof is connected to the semiconductor layer. The second bridge layer connects the semiconductor layer with the pixel electrode.

Display device and method of fabricating the same

A display device includes a substrate, a first conductive layer on the substrate, the first conductive layer including a data signal line, a first insulating layer on the first conductive layer, a semiconductor layer on the first insulating layer, the semiconductor layer including a first semiconductor pattern, a second insulating layer on the semiconductor layer, and a second conductive layer on the second insulating layer, the second conductive layer including a gate electrode disposed to overlap the first semiconductor pattern, a transistor first electrode disposed to overlap a part of the first semiconductor pattern, wherein the transistor first electrode is electrically connected to the data signal line through a contact hole that penetrates the first and second insulating layers, and a transistor second electrode disposed to overlap another part of the first semiconductor pattern.

Display device

A display device includes a substrate having a display area and a pad area. A gate conductive layer disposed on the substrate includes a gate conductive metal layer and a gate capping layer. The gate conductive layer forms a gate electrode in the display area and a wire pad in the pad area that is exposed by a pad opening. An interlayer insulating film disposed on the gate conductive layer covers the gate electrode. A data conductive layer disposed on the interlayer insulating film in the display area includes source and drain electrodes. A passivation layer disposed on the data conductive layer covers the source and drain electrodes. A via layer is disposed on the passivation layer. A pixel electrode is disposed on the via layer. The pixel electrode is connected to the source electrode through a contact hole penetrating the via layer and the passivation layer.

Display device with gate conductive layer forming wire pad in pad area and method of fabricating the same

A display device is provided. The display device includes: a first substrate that comprises a first base substrate, an insulating layer located on the first base substrate, and a barrier layer located on the insulating layer; a second substrate that faces the first substrate; a liquid crystal layer that is located between the first substrate and the second substrate; and a first spacer that is located between the first substrate and the second substrate and is in contact with the first substrate, wherein the first substrate further comprises a second spacer that is located on the barrier layer and overlaps with the first spacer.

Provided are a display device its method of manufacturing. The device includes a base; first and second thin-film transistors (TFT) on the base, adjacent to each; an organic layer covering the first and second TFT, including a first and second opening overlapping the drain electrodes of the first and second TFT, respectively; a common electrode on the organic layer comprising a common electrode opening overlapping the first opening and another common electrode opening overlapping the second opening; an insulating layer on a bump spacer which is on the common electrode; a first and second pixel electrode on the insulating layer overlapping the common electrode and electrically connected to the first and second TFT, respectively, wherein a minimum distance between the bump spacer and the common electrode opening is substantially equal to a minimum distance between the bump spacer and the other common electrode opening.

Growing community of inventors

Hwaseong-si, South Korea

Seung Ha Choi