Korea Kumho Petrochemical Co., Ltd.

Seung Duk Cho

Young Hoon Ko

Jung Hoon Oh

Dae Kyung Yoon

Byung C Jeon

Yong Hwa Hong

So Jeong Park

A photoacid generator represented by the following formula (1), a method for producing the photoacid generator, and a resist composition containing the photoacid generator are provided. wherein in the formula (1), Y, X, R, R, n, nand Ahave the same meanings as defined in the detailed description of the invention. The photoacid generator can maintain an appropriate contact angle at the time of ArF liquid immersion lithography, can reduce defects occurring during liquid immersion lithography, and has excellent solubility in resist solvents and excellent compatibility with resins. Furthermore, the photoacid generator can be produced by an efficient and simple method using an epoxy compound that is industrially easily available.

Photoacid generator, method for producing the same, and resist composition comprising the same

A sulfonium compound represented by the following formula (1), a photoacid generator containing the sulfonium compound, and a resist composition containing the photoacid generator are provided: wherein X represents an electron donor group; Rand Reach independently represent an alkyl group or the like; Rto Reach independently represent an alkyl group, or the like; Rrepresents a cyclic alkenediyl group or the like; and &#x2212;A represents an anion. The sulfonium compound has a photon yield that is controllable by introducing different absorbers to the cation region in one molecule, can address the inconvenience of using a mixture of different photoacid generators when the sulfonium compound is applied as a photoacid generator, has excellent miscibility in a resist, and has enhanced resolution and line edge roughness.

Sulfonium compound, photoacid generator, and resist composition

The present invention relates to a polymerization method for preparing non-halogenated aromatic polyesters by a standard interfacial polymerization except the addition of a phase-transfer catalyst to the organic phase. More specifically, the present invention offers a method for substantially reducing the polymerization time and improving the reaction yield, by introducing a specific phase transfer catalyst, tetrabutyl ammonium bromide, to the organic phase.

Polymerization method for preparing non-halogenated aromatic

A phosphorus-containing wholly aromatic polyester is produced by an interfacial polymerization method which includes the step of reacting a phosphorus-containing bisphenol compound and a bisphenol compound with dicarboxylic acid chlorides. An organic layer containing the dicarboxylic acid chlorides and phase transfer catalyst is added into an alkaline aqueous layer which contains a bisphenol compound.

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Chungcheongnam-do, South Korea

Seung Duk Cho