Samsung Electronics Co., Ltd.

Eo Technics Co., Ltd

Seulgi Lee

Younghyun Kim

Bongjin Ko

Heejin Kang

Hyounyoung Lee

Jiyu Lee

Seungil Lim

Sangmin Lee

Taehyun Kim

Jungchul Lee

Ingi Kim

Sangwoo Bae

Minhwan Seo

Dohyung Kim

Youngjoo Lee

Insung Kim

Eunhee Jeang

Wondon Joo

Seongchul Hong

Kyungsik Kang

Youngsu Lee

Motoshi Sakai

Myeongock Ko

Sungwook Jung

Hyangrok Lee

Hyukjun Kwon

Boris Afinogenov

Maksim Riabko

Anton Medvedev

Aleksandr Shorokhov

Anton Sofronov

Kyunghun Han

A washing machine with drying function includes a cabinet including a laundry insertion hole on a front surface; a tub inside the cabinet and having a rear opening and a front opening; a drum inside the tub; and a heated air supplying device including a heat exchange duct above the tub, and including an evaporator and a condenser, a rear duct behind the tub, an inlet duct between the rear duct and a first side of the heat exchange duct, a supply duct on a second side of the heat exchange duct, a blower fan in front of the tub to generate an airflow from the rear opening, through the rear duct, through the inlet duct, through the heat exchange duct, through the supply duct, and to the front opening, and a dehumidifier inside the rear duct and configured to remove moisture contained in the airflow passing through the rear duct.

Washing machine with drying function

A method of operating an apparatus for laser annealing, includes reducing temporal or spatial coherency of a plurality of laser beams by beam superimposing; and reducing an electric field inner product magnitude of beams having the reduced temporal or spatial coherency by a fly eye lens array to reduce coherency, and/or by modifying a polarization state between the beams by beam superimposing.

Apparatus for laser annealing and operating method thereof

A washing machine including a main body; a tub disposed inside the main body; a drum rotatably disposed inside the tub; a drying device including a compressor so that the drying device is configured to remove moisture from air discharged from the tub, heat the air from which the moisture was removed, and supply the heated air to the tub; and a support device disposed between the tub and the drying device. The support device may include a first support member longitudinally extending along a front and back direction of the main body, and a second support member longitudinally extending along a left and right direction of the main body, wherein at least one of the first support member and the second support member passes below the compressor, so that the first support member and the second support member are thereby configured to support the drying device above the tub.

A washing machine with drying function includes a cabinet having a laundry insertion hole; a tub having a front opening, and a back opening; a drum; and a heated air supplying device above the tub that includes an evaporator, a condenser, a heater, a heat exchange duct, an inlet, a supply duct, and a blower fan. Air from the back opening of the tub is introduced into the inlet duct and is guided by the inlet duct and received by the heat exchange duct and then passes through the heat exchange duct in a lateral direction of the tub. The air passed through the heat exchange duct is received by the supply duct and discharged by the supply duct toward a front side of the tub. The blower fan forms causes the air discharged from the supply duct to be supplied to the tub.

A washing machine with drying function may include a cabinet with a laundry insertion hole; a tub having a front opening and a back opening; a drum inside the tub, the laundry insertion hole, front opening, and drum being positioned so that laundry is insertable through the laundry insertion hole; a heated air supplying device with a heat exchange part above the tub, a front and back duct, and a blower fan to form an airflow, via the back and front duct, from the back opening to the heat exchange part, and then to the front opening; a lint filter in the back duct; a sensor to detect lint in the lint filter and produce a corresponding signal; a washing device to spray washing water toward the lint filter; and a processor to control the washing device to spray the washing water based on the signal produced by the sensor.

A clothes dryer including a device and space for fixing a dryer sheet inside a main body. The clothes dryer includes: a main body including a laundry inlet: a drum rotatably installed inside the main body; a discharge flow path configured to discharge inside air of the drum to outside of the drum; and a sheet receiver accommodating a dryer sheet for providing fragrance to inside of the drum, the sheet receiver positioned on the discharge flow path and detachably installed in the main body.

Clothes dryer

A substrate inspection apparatus includes a light source unit, a pulsed beam matching unit, a substrate support unit, an incidence angle adjusting unit, and a detecting unit. The light source unit emits a first laser beam having a first wavelength and a second laser beam having a second wavelength. The pulsed beam matching unit matches the first laser beam and the second laser beam to superimpose a pulse of the first laser beam on a pulse of the second laser beam in time and space. The substrate support unit supports a substrate to be inspected. The incidence angle adjusting unit adjusts angles of incidence of the matched first laser beam and second laser beams to irradiate the first laser beam and the second laser beam on the substrate, and mixes the first laser beam and the second laser beam to generate an evanescent wave on the substrate. The evanescent wave generates scattered light due to a defect of the substrate. The detecting unit detects the scattered light generated due to the defect of the substrate.

Substrate inspection system and method of manufacturing semiconductor device using substrate inspection system

A wafer inspection apparatus includes: an objective lens on an optical path of first and second input beams; and an image sensor configured to generate an image of the wafer based on scattered light according to a nonlinear optical phenomenon based on the first and second input beams, wherein the first input beam passing through the objective lens is obliquely incident on the wafer at a first incident angle with respect to a vertical line that is normal to an upper surface of the wafer, the second input beam passing through the objective lens is incident on the wafer at a second incident angle oblique to the vertical line that is normal to the upper surface of the wafer, and the first and second incident angles are different from each other.

Wafer inspection apparatus and system including the same

A laser beam delivery apparatus of an extreme ultra violet light source may include a high power seed module configured to generate a laser beam, a power amplifier configured to amplify the laser beam generated by the high power seed module, a beam transfer module configured to collect and move the laser beam amplified by the power amplifier, a final focusing assembly optical platform configured to adjust focus of the laser beam collected and moved by the beam transfer module, and a focusing unit configured to focus the laser beam with the focus adjusted by the final focusing assembly optical platform to a target droplet. The power amplifier may include a position adjuster configured to adjust a position of the laser beam. The position adjuster may include a refraction plate having a flat surface. The power amplifier may include a pointing adjuster, which may include a mirror.

Laser beam delivery apparatus for extreme ultra violet light source

Growing community of inventors

Cheongju-si, South Korea

Seulgi Lee