Samsung Electronics Co., Ltd.

Sungkyunkwan University

Seulgi Kim

Kangwon Lee

Eunsik Jang

Hyonseok Song

Inyong Kang

JuHyoung Lee

Mun Ja Kim

Jibeom Yoo

Kibong Nam

Jinho Yeo

A method for inspecting a reticle including a reflective layer on a reticle substrate is provided. The method may include loading the reticle on a stage, cooling the reticle substrate to a temperature lower than a room temperature, irradiating a laser beam to the reflective layer on the reticle substrate, receiving the laser beam using a photodetector to obtain an image of the reflective layer, and detect a particle defect on the reflective layer or a void defect in the reflective layer based on the image of the reflective layer.

Method for inspecting a reticle, a method for manufacturing a reticle, and a method for manufacturing a semiconductor device using the same

Methods of manufacturing a pellicle assembly may include forming a sublimable support layer on a first surface of a pellicle membrane, attaching a pellicle frame to a second surface of the pellicle membrane while the sublimable support layer is on the first surface of the pellicle membrane, and sublimating the sublimable support layer while the pellicle frame is attached to the pellicle membrane. In order to manufacture a photomask assembly, a photomask is fixed to the pellicle frame such that the photomask faces the pellicle membrane with the pellicle frame therebetween.

Methods of manufacturing pellicle assembly and photomask assembly

Growing community of inventors

Hwaseong, South Korea

Seulgi Kim