Konica Minolta Opto, Inc.

Konica Corporation

Setsuo Tokuhiro

Tatsuo Ohta

Nobuyoshi Mori

Takuji Hatano

Satoshi Nakano

Shingo Nakamura

Kazuo Ishida

Kunihiko Taka

Katsuya Nakamura

Akiko Hara

Disclosed is an optical element to be subjected to a reflow process at high temperatures, wherein cracks or wrinkles can be prevented from occurring in an antireflection film. A method for producing the optical element, and a method for manufacturing an electronic device using the optical element are also disclosed. Specifically disclosed is a method for producing an optical element comprising a base, wherein at least one optical surface is composed of a resin material, and a coating formed on the optical surface of the base and composed of an inorganic material, the optical element being mounted on a substrate together with an electronic component by a reflow process at a temperature Ta. The method is characterized in that the coating is formed at a film-forming temperature Tb of not less than (Ta&#x2212;60&#xb0; C.), and a material having a glass transition temperature of not less than 290&#xb0; C. or a glass transition temperature of not less than (Tb&#x2212;50&#xb0; C.) is used as the resin material.

Method for producing an optical element

An optical element for reflecting solar light has excellent weather resistance, and furthermore, a high reflectance in a wide band. When solar light enters an optical element (OE), light (L) in a short wavelength band among the solar light is reflected by a dielectric multilayer film (DF). Other light (L) in longer wavelength bands are passed through the dielectric multilayer film (DF), then a base material (SS), and reflected by a metal deposition film (MV) to pass through the base material (SS) and the dielectric multilayer film (DF). Thus, high reflectance in a wide band is ensured.

Optical element

Provided is a highly reliable solar collecting system. Since a concave minor has a reflection film on a base material on the side opposite to the side of a solar light incoming surface, peeling, breaking and the like are suppressed by protecting the reflection film by the base material, even when a dropping material is brought into contact with the side of the reflection film with impact or accumulated dropped materials are periodically cleaned. As an elliptical mirror has a reflection film on the base material on the side of the solar light incoming surface, even when solar light having large energy enters, the solar light is reflected by the reflection surface before reaching the base material and there is a small possibility of having the base material heated.

Sunlight collecting system

An optical element irradiated with a light flux having a wavelength of 350 nm to 450 nm, is provided with a synthetic resin base material; and an antireflection film provided on the synthetic resin base material and including a contact layer being in contact with the synthetic resin base material, wherein the contact layer is a film made of a material containing no oxygen atom or a film made of a mixed material or a material containing no oxygen atom and a material containing an oxygen atom in which the mixed material contains the material containing an oxygen atom less than 10%.

Optical element and optical pickup device

An antireflection coating provided on an optical element which passes through at least two wavelengths of light in the wavelength range of 1300-1600 nm, wherein the antireflection coating comprises: a high refractive index layer; a low refractive index layer having a refractive index lower than a refractive index of the high refractive index layer; and a supplementary layer having a composition different from a composition of the high refractive index layer or from a composition of the low refractive index layer, and being provided adjacent to the high refractive index layer or to the low refractive index layer.

Antireflection coating, optical element, and optical transceiver module

An electromagnetic wave attenuating transparent member includes; a transparent base material, and a plurality of structural layers including at least one transparent conductive layer. Sheet resistivity of the electromagnetic wave attenuating transparent member is 100 &OHgr;/cm,or less, and the plurality of structural layers include a first layer and a second layer which is provided to be farther than the first layer from the transparent base material, and has density which is higher than that of the first layer.

Electromagnetic wave attenuating transparent member

An optical member includes a synthetic resin substrate: and an antireflection film including at least a mixture film composed of tantalum oxide (Ta.sub.2 O.sub.5) and titanium oxide (TiO.sub.2), and a film having a refractive index lower than that of the mixture film. The antireflection film is coated on the synthetic resin substrate.

Growing community of inventors

Tokorozawa, Japan

Setsuo Tokuhiro