Canon Kabushiki Kaisha

Setsuo Minami

Noritaka Mochizuki

Yoshiya Matsui

Kazuo Minoura

Muneharu Sugiura

Atsuo Tsunoda

Koyo Midorikawa

Hidetoshi Murase

Mikio Suzuta

Masazumi Moriwaki

Masamichi Tateoka

Tadashi Sato

Naoto Kawamura

Kazuya Matsumoto

Toshiaki Asano

Hideki Ina

Masayuki Suzuki

Yutaka Watanabe

Sadahiko Tsuji

Noriyuki Nose

Koichi Miyamoto

Kazuhiko Matsuoka

Takao Kariya

Takeshi Baba

Yasuaki Fukuda

Mitsuhiro Tokuhara

Sadatoshi Takahashi

Akira Tajima

Takeshi Goshima

Shigetaro Ogura

Takao Tsuji

Hideo Yoshikawa

Yasuo Kawai

Tadasu Taniguchi

Yoichi Hirabayashi

Akinori Hasu

Isao Harumoto

Shiro Hirai

Masami Ohkubo

Shih Yamaguchi

A circuit pattern surface curving in correspondence with the surface shape of a ball-like semiconductor device material such as a silicon ball is formed in a reticle. A resist-applied surface of the device material is so exposed as to move the ball-like semiconductor device material close to the circuit pattern surface. In this manner, a circuit pattern is formed on the surface of the ball-like device material.

Ball-shaped device exposure apparatus and ball-shaped device manufacturing method

An X-ray exposure apparatus includes a stage for holding a mask having a pattern for circuit manufacturing, a stage for holding a wafer to be exposed to the pattern of the mask with X-rays, and a reflection reduction imaging system, disposed between the mask stage and the wafer stage, including a reflecting mirror arrangement, containing at least three, but not more than five, reflecting mirrors coated with multi-layer films for receiving X-rays from the mask and directing them to the wafer to expose the wafer to the pattern of the mask with the X-ray in a reduced scale.

X-ray reduction projection exposure system of reflection type

A compound eye optical system having a variable magnification function includes a first imaging element array having a plurality of imaging elements of the same focal length at an equal pitch, a second imaging element array having a plurality of imaging elements of the same focal length arranged at a pitch different from that of the first imaging element array, the second imaging element array disposed more adjacent to the image side than the first imaging element array, and means for varying the imaging magnification of a composite optical system comprising the first and second imaging element arrays.

Compound eye optical system having a variable magnification function

A projecting device comprising an array of axial element lens systems, wherein each element lens system includes a single bar lens having an axial length larger than the effective aperture and adapted to form an intermediate image of a pixel of the object plane and an erect image of a magnification of unity not vertically nor laterally inverted in such a manner that the light intensity on the image plane corresponding to said pixel is defined in the form of Gaussian distribution by the eclipse of the aperture. The element lens systems are arranged in a plane perpendicular to the optical axis so as to cause the light intensity distributions of said systems to mutually overlap in the peripheral areas thereof on the image plane, wherein each row of the systems in the array is displaced by a half pitch with respect to the neighboring row to constitute a staggered arrangement thereby achieving a uniform exposure distribution, integrated in time, in the scanning direction.

Projecting device

A projecting device for projecting an image of the surface of a body on a light receiving surface, in which optical element blocks are provided symmetrically with respect to a stop, of which the diameter of aperture is always constant in varying the magnification. The device includes a projecting optical system to change the focal length by symmetrically moving with respect to the stop at least a part or the whole of the optical element blocks, and means for restricting the field of the surface of a body, disposed between said projecting optical system and the surface of the body. The exposure amount on the light receiving surface is maintained substantially constant in varying the magnification by making the change of the focussing magnification of the projecting optical system to mainly correspond with the change of refractive power of the optical element blocks which are disposed on both sides of said stop.

Variable power projecting device

An optical system for scanning a medium with a beam spot includes a light beam generator, a deflector for deflecting the light beam in a predetermined direction and in deflection plane, and an imaging optical system between the deflector and the medium for imaging the light beam from the deflector on the medium as a beam spot, the imaging optical system having at least one lens element mode of a moisture absorbing material. The lens element has a shape in which the dimension in a direction parallel to the deflection plane of the light beam is greater than the dimension in a direction perpendicular to the deflection plane of the light beam. A device mitigates any influence on the imaged condition of the light beam on the medium caused by the lens element being subjected to moisture.

Scanning optical system subjected to a moisture proof treatment

A zoom objective comprising four lens groups of which the first three lens groups counting from the object side are movable for zooming, whereby the refractive powers and the conditions of zooming movement of the aforesaid three lens groups are properly specified so as to improve the compactness while still maintaining good correction of aberrations.

Zoom objective

A compound eye projection device includes a first lens and a second lens equal in shape and power. These two lenses are disposed with their optical axis being coincident with each other and together constitute an element lens system. A plurality of such element lens systems are arranged in a line form in a predetermined direction to thereby form a projection device.

Compound eye projection device

A projection apparatus for forming an image of original on a photosensitive material opposed to the plane of the original. The projection apparatus has a projecting system composed of a plurality of projection optical system arrays. Each individual projection optical system is composed of a first and a second lens coaxially disposed and having a relatively large length as compared with its effective lens diameter respectively. The first lens is an exit side telecentric lens whereas the second one is an incident side telecentric lens. The first lens forms an intermediate image of a portion of the original on a plane between the first and second lenses and the second lens reforms the intermediate image on the photosensitive material.

Projection apparatus

A projecting device is disclosed which has plural element lens systems arranged in at least two rows in a staggered fashion in two grooved blocks, with one row displaced relative to the adjacent row by a distance equal to half the pitch of the adjacent row. Each lens system is composed of at least one bar lens for imaging a part of the object as a part of the corresponding image. An opaque elastomer material fills the space between the rows for preventing light from entering into the space while allowing the positional relation between the rows to be fine-adjusted.

This specification discloses a projection device in which bar lenses of plastic, each having a great length in the direction of its optical axis as compared with its effective diameter, of the lenses are arranged in the form of a predetermined array. The bar lenses are shielded from the outside atmosphere by a holding member capable of easily setting the lenses. Further, transparent plates, such as glass plates or the like, are provided at the incidence end and the emergence end to seal the holding member, so that there occurs no deterioration of the predetermined optical performance resulting from variations in the environmental humidity which would otherwise cause variations in the plastic material.

Projection device

This specification discloses a projection device in which a plurality of element lens systems for projecting a part area of an object onto a predetermined part area on the image plane at erect one-to-one magnification are arranged parallel to one another in a plane perpendicular to the optical axis. Each element lens system is a telecentric system comprising three thin lenses of the same shape arranged in the direction of the optical axis, and an intermediate lens is provided at a position deviated from the intermediate point between the object side lens and the image plane side lens. A light absorbing member for extinguishing any light rays exceeding the effective lens diameter is provided between the lenses, and the light intensity distribution on the image plane of each element lens system is controlled substantially to Gauss distribution form by aperture eclipse and, even if there is any error in the arrangement interval, the exposure amount distribution in the arrangement direction superposed on the image plane is uniform.

Optical scanning device of this invention includes an optical source to produce light rays, means for deflecting light rays toward a predetermined direction, a surface to be scanned by the deflected light rays, a single lens disposed between the deflecting means and the surface to focus the deflected light rays on the surface to be scanned, a partial optical system consisting of said deflecting means and the single lens having means to move light rays on the surface at a constant speed.

Optical scanning device with constant speed scan

A projecting device having an array, in a plane perpendicular to the optical axis, of plural element lens systems each axially provided with two bar lenses of an axial length larger than the effective diameter thereof, characterized by the presence of an intermediate ring positioned between two bar lenses for extracting the effective beam emerging from the first bar lens and entering the second bar lens and providing a determined light intensity distribution on the projection plane.

A scanning projection apparatus including a first imaging optical system, a first plane provided on one side of the optical system, a deflector for deflecting a light beam emerging from the first plane and passing through the first imaging optical system, a second imaging optical system for receiving the light beam deflected by the deflector and a second plane provided at the focusing position of the light beam by the second imaging optical system, whereby the first plane is scanned with a slit of a width .DELTA.S, using the deflector, and the thus obtained slit image of the first plane is projected in succession on a determined position in said second plane, wherein the slit width .DELTA.S is selected to satisfy a relation .DELTA.S&lt;1/Rp in which Rp represents the resolving power of the image on the second plane, and wherein the first or second imaging optical system includes elements for correcting the image magnification in the longitudinal direction of the slit.

Growing community of inventors

Kawasaki, Japan

Setsuo Minami