Corning Incorporated

Seshian Annamalai

Kenneth Edward Hrdina

Carlos Alberto Duran

The present disclosure is directed to a doped silica-titania glass, DST glass, consisting essentially of 0.1 wt. % to 5 wt. % halogen, 50 ppm-wt. to 6 wt. % one or more oxides of Al, Ta and Nb, 3 wt. % to 10 wt. % TiOand the remainder SiO. In an embodiment the halogen content can be in the range of 0.2 wt. % to 3 wt. % along with 50 ppm-wt. to 6 wt. % one or more oxides of Al, Ta and Nb, 3 wt. % to 10 wt. % TiOand the remainder SiO. In an embodiment the DST glass has an OH concentration of less than 100 ppm. In another embodiment the OH concentration is less than 50 ppm. The DST glass has a fictive temperature Tof less than 875&#xb0; C. In an embodiment Tis less than 825&#xb0; C. In another embodiment Tis less than 775&#xb0; C.

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Painted Post, NY, United States of America

Seshian Annamalai