Samsung Electronics Co., Ltd.

Seouk-Hoon Woo

Chang-min Park

Jeong-Ho Yeo

Byeong-Ok Cho

Won-Sun Kim

Joo-On Park

A method of inspecting a structure. The method includes preparing preliminary spectrums of reference diffraction intensities according to critical dimensions of reference structures, obtaining a linear spectrum from the preliminary spectrums in a set critical dimension range, radiating light to respective measurement structures formed on a substrate, measuring measurement diffraction intensities of the light diffracted by the measurement structures, and obtaining respective critical dimensions of the measurement structures from the measurement diffraction intensities using the linear spectrum.

Growing community of inventors

Hwaseong-si, South Korea

Seouk-Hoon Woo