Samsung Electronics Co., Ltd.

Seongyun Ryu

Taehyun Kim

Seungjun Lee

Sungmin Jang

Woosung Choi

Joungwoo Han

Haeyong Choi

Kyeongmin Baek

Byungku Yoo

Seongkeun Kang

An integrated waste gas treatment system includes an adsorption/desorption device that receives a waste gas that includes an organic compound and an organic nitrogen compound exhausted from a semiconductor manufacturing facility, where the adsorption/desorption device adsorbs the organic compound and the organic nitrogen compound and concentrates and desorbs the organic compound and the organic nitrogen compound, and a catalytic decomposition device disposed adjacent to the adsorption/desorption device, where the catalytic decomposition device includes a catalytic chamber that provides a gas passage through which a gas desorbed from the adsorption/desorption device flows and an oxidation-reduction catalyst disposed in the gas passage that removes the organic compound and the organic nitrogen compound from the desorbed gas. The organic compound and the organic nitrogen compound are subjected to an oxidation treatment by the oxidation-reduction catalyst, and nitrogen oxides generated by the oxidation treatment are removed by a selective reduction reaction.

Catalytic decomposition device and integrated waste gas treatment system

Growing community of inventors

Asan-si, South Korea

Seongyun Ryu