Süss Microtec Photomask Equipment Gmbh & Co. Kg

Suss Microtec Solutions Gmbh & Co. Kg

Seongkuk Lee

Habib Hichri

Uwe Dietze

Davide Dattilo

Martin Samayoa

A method and an apparatus for cleaning a substrate having at least one surface having a residue to be removed thereon is described. The method comprises: scanning at least an area of the surface having the residue thereon with laser light to thereby heat the surface and the residue; controlling the heating so that a part of the residue first liquefies such that the liquefied part of the residue starts flowing towards the solid part of the residue, thereby forming a meniscus with the solid part of the residue and accumulating in part on top of the solid part, the thus generated thicker layer of residue absorbing further heat to be decomposed or vaporized.

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Corona, CA, United States of America

Seongkuk Lee