Samsung Electronics Co., Ltd.

Seongha Jeong

Dougyong Sung

Ungyo Jung

Jongwoo Sun

Kyung-Sun Kim

Donghyeon Na

Dongwan Kim

Jewoo Han

Kangmin Jeon

Myeongsoo Shin

Dongseok Han

Cheonkyu Lee

Minkyu Sung

Iksu Byun

Moonseok Kim

Kimoon Jung

Changwoo Song

A gas supply assembly for a substrate processing apparatus includes a gas introduction part, a gas distribution plate connected to the gas introduction part, the gas distribution plate including a plurality of through holes, and a shower head disposed under the gas distribution plate, the shower head including a plurality of distribution holes in fluid communication with the plurality of through holes. One through hole is in fluid communication with at least two distribution holes, and each of the plurality of distribution holes has a first diameter and a second diameter differing from each other in the shower head.

Gas supply assembly and substrate processing apparatus including the same

A method of etching at a low temperature includes cooling a pedestal on which a wafer is disposed, etching the wafer by generating plasma from a gas supplied through a gas distribution unit, and injecting a heated inert gas into the chamber through the gas distribution unit.

Method of etching at low temperature and plasma etching apparatus

Growing community of inventors

Hwaseong-si, South Korea

Seongha Jeong