Lg Display Co., Ltd.

Dongwoo Fine-chem Co., Ltd.

Seong-Su Kim

Gee-Sung Chae

Gyoo-Chul Jo

Oh-Nam Kwon

Kyoung-Mook Lee

Seung-yong Lee

Yong-Sup Hwang

Yong-suk Choi

An etching solution for a multiple layer of copper and molybdenum includes: about 5% to about 30% by weight of a hydrogen peroxide; about 0.5% to about 5% by weight of an organic acid; about 0.2% to about 5% by weight of a phosphate; about 0.2% to about 5% by weight of a first additive having nitrogen; about 0.2% to about 5% by weight of a second additive having nitrogen; about 0.01% to about 1.0% by weight of a fluoric compound; and de-ionized water making a total amount of the etching solution 100% by weight.

Etching solution for multiple layer of copper and molybdenum and etching method using the same

Growing community of inventors

Annyang-si, South Korea

Seong-Su Kim