Samsung Electronics Co., Ltd.

Seong-Chul Choi

Sang-Ho Lee

Kyung-Sun Kim

Doug-Yong Sung

Ji-Hee Kim

Hak-Young Kim

Ji-Myoung Lee

Seong-Moon Ha

Kyeong-Seok Jeong

Min-Kyu Sung

Seung-Hee Cho

A temperature controller of a plasma-processing apparatus including a heating unit and a cooling unit. The heating unit is configured to heat a liner on an inner surface of a plasma chamber in which a plasma is formed. The cooling unit is configured to cool the liner to controls a temperature of an upper electrode in the plasma chamber.

Temperature controller and a plasma-processing apparatus including the same

A plasma processing device is provided. The plasma processing device includes a plate formed between a window covering a top portion of a chamber where plasma processing is performed and an antenna generating a magnetic field, and a fluid supply unit supplying a fluid for controlling temperatures of the window and the antenna, wherein the plate includes first and second regions supplied with the fluid, and the fluid supply unit independently controls the first and second regions.

Plasma processing device

Growing community of inventors

Suwon-si, South Korea

Seong-Chul Choi