Vishay-siliconix

Seokjin Jo

Lingpeng Guan

Kyle Terrill

Trench MOSFET with self-aligned body contact with spacer. In accordance with an embodiment of the present invention, a plurality of gate trenches are formed into a semiconductor substrate. A body contact trench is formed into the semiconductor substrate in a mesa between the gate trenches. Spacers are deposited on sidewalls of the body contact trench. An ohmic body contact is implanted into the semiconductor substrate through the body contact trench utilizing the spacers to self-align the implant. A body contact trench extension may be etched into the semiconductor substrate through the body contact trench utilizing the spacers to self-align the etch, prior to the implant.

Trench MOSFET with self-aligned body contact with spacer

Trench MOSFET with self-aligned body contact with spacer. In accordance with an embodiment of the present invention, a semiconductor device includes a semiconductor substrate, and at least two gate trenches formed in the semiconductor substrate. Each of the trenches comprises a gate electrode. The semiconductor device also includes a body contact trench formed in the semiconductor substrate between the gate trenches. The body contact trench has a lower width at the bottom of the body contact trench and an ohmic body contact implant beneath the body contact trench. The horizontal extent of the ohmic body contact implant is not greater than the lower width of the body contact trench.

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San Jose, CA, United States of America

Seokjin Jo