Samsung Electronics Co., Ltd.

Seoul National University

Seokhyun Lim

Younghan Kim

Hyun-Chul Yoon

Haecheon Choi

Jin Il Oh

Soonwon Hwang

A method of fabricating a semiconductor device with conductive patterns comprises sequentially forming an etch-target layer and a middle mold layer on a substrate, forming a first upper mold pattern and a second upper mold pattern on the middle mold layer to have top surfaces at different levels, etching the middle mold layer using the first and second upper mold patterns as an etch mask to form first and second middle mold patterns, respectively, forming a third middle mold pattern between the first and second middle mold patterns, and etching the etch-target layer using the first to third middle mold patterns as an etch mask to form conductive patterns.

Methods of fabricating semiconductor devices

A micro channel unit having a shape designed to reduce a pressure drop when fluid passes through a connecting channel portion is provided. The micro channel unit includes a micro channel with a width of micrometer dimensions through which liquid flows. The micro channel includes a plurality of straight channel portions and connecting channel portions that connect each pair of adjacent straight channel portions. The connecting channel portions are wider than the straight channel portions connected by the connecting channel portions. The use of the micro channel unit can reduce the pressure drop when fluid passes through the connecting channel portions, thereby reducing the amount of power required to drive the fluid flow and further enabling miniaturization of microfluidic devices such as pumps and peripheral devices.

Micro channel unit

Growing community of inventors

Seoul, South Korea

Seokhyun Lim