Lg Display Co., Ltd.

Lg Philips Lcd Co., Inc.

Penta Security Systems Inc.

Seok-Woo Lee

Young-Joo Kim

Yong-In Park

Jae-Sung Yu

Soo-Jeong Park

Kum-Mi Oh

Han-Seok Lee

In-Hyuk Song

Dong-Cheon Shin

Young-Ki Jung

Won-Keun Park

Duk-Soo Kim

Eui-seok Kim

Kwang-Sik Hwang

Hee-Sun Shin

Tae-Joon Jung

A liquid crystal display includes an insulating substrate having a pixel portion divided into a thin film transistor region and a storage region, a first active layer formed on the substrate to cover at least the thin film transistor region, and a storage electrode formed on the first active layer to selectively cover the storage region.

Liquid crystal display and method for fabricating the same

A method of manufacturing an array substrate for a fringe field switching mode liquid crystal display includes: forming an auxiliary insulating layer on a second passivation layer and having a first thickness; forming first and second photoresist patterns on the auxiliary insulating layer and having second and third thicknesses, respectively, the second thickness greater than the third thickness; etching the auxiliary insulating layer, the second passivation layer and a first passivation layer to form a drain contact hole; performing an ashing to remove the second photoresist pattern and expose the auxiliary insulating layer therebelow; performing a dry etching to remove the auxiliary insulating layer not covered by the first photoresist pattern and expose the first passivation layer and to form an insulating pattern below the first photoresist pattern, the insulating pattern and the first photoresist pattern forming an undercut shape; forming a transparent conductive material layer having a fourth thickness less than the first thickness; and performing a lift-off process to remove the first photoresist pattern and the transparent conductive material layer thereon together and form a pixel electrode as a remaining portion of the transparent conductive material layer.

Array substrate for fringe field switching mode liquid crystal display and method of manufacturing the same

A liquid crystal display device includes a display region having unit pixels arranged thereon in a matrix, and a driving circuit unit having at least a LDD (Lightly Doped Drain) type TFT and a GOLDD (Gate overlapped Lightly Doped Drain) type TFT.

Liquid crystal display device having GOLDD type TFT and LDD type TFT and method of making same

Provided is a data security method and apparatus using a characteristic preserving encryption. The data security apparatus includes an interface communicating with a user terminal or a database server, an input unit receiving information, an output unit outputting information, an encryption unit encrypting data in the data security method, a storage unit storing information, and a control unit controlling functions of the interface, the input unit, the output unit, the encryption unit or the storing unit.

Data security method and apparatus using a characteristic preserving encryption

A method for fabricating is provided for a liquid crystal display device capable of decreasing the number of masks used to fabricate a thin film transistor (TFT) by forming an active pattern and a storage electrode by a single mask process, by simultaneously patterning a pixel electrode at the time of a gate line patterning, and by using only an organic insulation layer having a low dielectric constant.

Liquid crystal display device and method for fabricating the same

A liquid crystal display device includes: a first auxiliary line connected to the blocking pattern and below a gate line; a second auxiliary line in each touch block, and located at the same layer as, the first auxiliary line being made of the same material as the gate line; a first connection pattern contacting the first and second auxiliary lines; a common electrode in each touch block; x and y sensing lines on the common line and overlapping the gate and data lines, respectively; a pixel electrode in each pixel region, connected to a drain electrode through a drain contact hole, and including a plurality of openings; and a second connection pattern contacting the first connection pattern and the x sensing line through first and second contact holes, respectively.

Liquid crystal display device and method of fabricating the same

A method of manufacturing an array substrate for a fringe field switching mode liquid crystal display includes: forming an auxiliary insulating layer having a first thickness; forming first and second photoresist patterns on the auxiliary insulating layer; performing an ashing to remove the second photoresist pattern and expose the auxiliary insulating layer therebelow; performing a dry etching to remove the auxiliary insulating layer not covered by the first photoresist pattern and expose a first passivation layer and to form an insulating pattern below the first photoresist pattern, the insulating pattern and the first photoresist pattern forming an undercut shape; forming a transparent conductive material layer having a fourth thickness less than the first thickness; and performing a lift-off process to remove the first photoresist pattern and the transparent conductive material layer thereon together and form a pixel electrode.

A method for fabricating a liquid crystal display (LCD) device includes providing a first substrate including a pixel portion and a circuit portion, the circuit portion having first and second regions; forming an active pattern and a first gate insulation film at the pixel portion and the circuit portion and forming a storage electrode on a portion of the active pattern of the pixel portion; forming a second gate insulation film on the first substrate; forming a gate electrode at the first region and forming p+ source and drain regions at portions of the active pattern of the first region; forming a gate electrode at the pixel portion and the second region, and forming a common line at the pixel portion; forming n+ source and drain regions at the pixel portion and at a portion of the active pattern of the second region; and joining the first and second substrates.

Liquid crystal display device and fabrication method thereof

A multi-channel type thin film transistor includes a gate electrode over a substrate extending along a first direction, a plurality of active layers parallel to and spaced apart from each other extending along a second direction crossing the first direction, and source and drain electrodes spaced apart from each other with respect to the gate electrode and extending along the first direction, wherein each of the plurality of active layers includes a channel region overlapped with the gate electrode, a source region, a drain region, and lightly doped drain (LDD) regions, one between the channel region and the source region and another one between the channel region and the drain region, wherein the LDD regions of the adjacent active layers have different lengths from each other.

Multi-channel type thin film transistor and method of fabricating the same

A liquid crystal display and a method for fabricating the same are disclosed. The method for fabricating a liquid crystal display includes preparing an insulating substrate defining a pixel portion divided into a thin film transistor region and a storage region, sequentially forming a polycrystalline silicon film and a storage electrode film on an entire surface of the substrate, selectively patterning the storage electrode film and the polycrystalline silicon film to form a pixel pattern that covers the pixel portion, and selectively removing the storage electrode film in the thin film transistor region to simultaneously form a first active layer in the thin film transistor region and form a storage electrode in the storage region, wherein the active layer is formed of the polycrystalline silicon film and the storage electrode is formed of the storage electrode film.

An array substrate for an LCD device and a method of fabricating the same are disclosed. The array substrate includes: a substrate defining a display area and a non-display area; an n-type driving TFT and a p-type driving TFT in the non-display area; a switching TFT in the display region; a storage capacitor in the display region, the storage capacitor including first to third storage layers sequentially layered with intervening insulating layers, wherein the first storage layer contacts a first semiconductor layer under the first storage layer; and a pixel electrode in the display region, the pixel electrode connected to the switching TFT.

Array substrate for liquid crystal display device

An LCD device and a method of fabricating the same are provided. The LCD device comprises a first substrate divided into a pixel unit and a circuit unit. Active patterns are disposed in the pixel unit and the circuit unit of the first substrate. A first insulating film is disposed on the first substrate. Gate electrodes are disposed in the pixel unit and the circuit unit of the first substrate, and common lines are disposed in the pixel unit of the first substrate. First contact holes and second contact holes are disposed in regions of the first insulating film, the first interlayer insulating film and the second interlayer insulating film. Source electrodes and drain electrodes electrically connect to the source regions and the drain regions of the active patterns through the first contact holes and the second contact holes.

A liquid crystal display and a method for fabricating the same are disclosed. The method for fabricating a liquid crystal display includes preparing an insulating substrate defining a TFT region of a pixel portion, forming an active layer on the substrate to cover the TFT region of the pixel region, forming a gate electrode of the pixel portion on the active layer, forming a source region of the pixel portion and a drain region of the pixel portion in the active layer at both sides of the gate electrode of the pixel portion, forming a passivation film having first and second contact holes on the substrate having the drain region of the pixel portion, the first and second contact holes respectively exposing the source region of the pixel portion and the drain region of the pixel portion, sequentially forming a transparent conductive film and a metal film on the passivation film, and selectively etching the metal film and the transparent conductive film to form a source electrode pattern of the pixel portion/a source electrode of the pixel portion, which are sequentially deposited to cover the first contact hole, and a drain electrode pattern of the pixel portion/a drain electrode of the pixel portion, which are sequentially deposited to cover the second contact hole.

Growing community of inventors

Gyeonggi-do, South Korea

Seok-Woo Lee