Lg Chem, Ltd

Xinmei Fontana Holding (Hong Kong) Limited

Seok Hoon Jang

Yeong Rae Chang

Boo Kyung Kim

Jin Seok Byun

Heon Kim

In Young Song

Jae Young Kim

Sung Joon Oh

Jeong Kyu Lee

Se Hyun Kwon

Yongjoon Heo

Jung Hyun Seo

Jae Hoon Shim

Joon Koo Kang

Eun Kyu Her

Soon Hwa Jung

Hee Jung Choi

Sung Don Hong

Seung Jung Lee

Ja Pil Koo

Yeongrae Jang

Provided is a hydrophobic silica aerogel precursor, and a hydrophobic silica aerogel produced using the same. In the methods, a linear silane crosslinking agent containing a PEG-derived unit is introduced when preparing a hydrophobic aerogel precursor, resulting in the production of a hydrophobic silica aerogel having improved high-temperature thermal stability and improved physical properties.

Aerogel precursor and aerogel produced using same

The present invention relates to a photocurable coating composition for forming a low refractive layer, a method for preparing an antireflection film using the photocurable coating composition, and an anti-reflective film prepared by using the photocurable coating composition. According to the present invention, a low refractive layer is formed of a photocurable coating composition containing two or more types of photo-polymerizable compounds, a photoinitiator, surface-treated hollow inorganic nanoparticles, and surface-treated solid inorganic nanoparticles.

Photocurable coating composition for forming low refractive layer

The present invention relates to a low refractive layer and an anti-reflective film comprising the same. The low refractive layer can exhibit excellent optical properties such as a low reflectance and a high light transmittance, and excellent mechanical properties such as high wear resistance and scratch resistance at the same time, without adversely affecting the color of the polymer resin forming the low refractive layer. In particular, due to the excellent alkali resistance, the low refractive layer can maintain excellent physical properties even after alkali treatment. Therefore, when introducing a low refractive layer to the display device, it is expected that the production process can be simplified and further the production rate and the productivity can significantly increase.

Low refractive layer and anti-reflective film comprising the same

The present invention relates to a low refractive layer and an anti-reflective film comprising the same. The low refractive layer can exhibit excellent optical properties such as a low reflectance and a high light transmittance, and excellent mechanical properties such as high wear resistance and scratch resistance at the same time. In particular, due to the excellent alkali resistance, the low refractive layer can maintain excellent physical properties even after alkali treatment. Therefore, when introducing a low refractive layer to the display device, it is expected that the production process can be simplified and further the production rate and the productivity can significantly increase.

The present invention relates to an antireflection film. The antireflection film includes a low refractive index layer having excellent alkali resistance and exhibiting remarkably improved mechanical properties such as scratch resistance and impact resistance as well as reduction of a glare phenomenon, and a base film exhibiting excellent mechanical strength and water resistance in spite of a thin thickness and having no fear of interference fringes occurring. Therefore, such antireflection film can be used as a protective film of a polarizing plate or used as any other component so as to provide a thin display device, and furthermore, can effectively prevent the glare phenomenon of the display device, and can more improve the durability and lifespan thereof.

Antireflection film

Described herein is an anti-reflective film including: a hard coating layer; and a low-refractive layer containing a binder resin and hollow inorganic nanoparticles and solid inorganic nanoparticles dispersed in the binder resin. The hollow and solid inorganic particles are dispersed in the low-refractive layer such that the amount of the solid inorganic nanoparticles positioned close to an interface between the hard coating layer and the low-refractive layer is larger than that of the hollow inorganic nanoparticles. Also described is a manufacturing method of the anti-reflective film including: applying a resin composition containing a photopolymerizable compound or a (co)polymer thereof, a fluorine-containing compound including a photoreactive functional group, a photoinitiator, hollow inorganic nanoparticles, and solid inorganic nanoparticles on a hard coating layer, and drying the applied resin composition at a temperature of 35&#xb0; C. to 100&#xb0; C.; and photocuring the dried resin composition.

Anti-reflective film and manufacturing method thereof

A photopolymerizable composition including: a polymer matrix or a precursor thereof containing a reaction product of an acrylate-based polyol and a compound containing at least one isocyanate group; a photoreactive monomer; and a non-reactive fluoro compound and a photoinitiator; a hologram recording medium produced from the composition; an optical element including the hologram recording medium; and a method of recording a hologram using the photopolymerizable composition.

Non-reactive fluoro compound and photopolymer composition comprising the same

The present invention relates to an anti-reflective film exhibiting one or more peaks (q) at a scattering vector of 0.0758 to 0.1256 nm, in a graph showing a log value of scattering intensity to a scattering vector defined in small-angle X-ray scattering.

Anti-reflective film

The present disclosure relates to a photopolymer composition including: a polymer matrix or a precursor thereof; a photoreactive monomer including a polyfunctional (meth)acrylate monomer having a refractive index of 1.5 or less and a viscosity at 25&#xb0; C. of 100 cps or less, and a monofunctional (meth)acrylate monomer having a refractive index of 1.5 or more; and a photoinitiator, wherein a content of the monofunctional (meth)acrylate monomer having a refractive index of 1.5 or more in the photoreactive monomer is 60 wt % or more. The present disclosure also relates to a hologram recording medium produced from the photopolymer composition, an optical element including the hologram recording medium, and a holographic recording method using the photopolymer composition.

Photopolymer composition

The present invention relates to a photopolymer composition comprising: a polymer matrix or a precursor thereof including a reaction product of a polyol including a polyrotaxane compound and a compound containing at least one isocyanate group; a photoreactive monomer; and a photoinitiator. The present invention also relates to a hologram recording medium produced from the photopolymer composition, an optical element comprising the hologram recording medium, and a holographic recording method using the photopolymer composition.

A photopolymer composition comprising a polymer matrix or a precursor thereof including a reaction product between (i) a (meth)acrylate-based (co)polymer in which a silane-based functional group is located in a branched chain and an equivalent weight of the silane-based functional group is 300 g/eq to 2000 g/eq, and (ii) a linear silane crosslinking agent; a photoreactive monomer; and a photoinitiator, a hologram recording medium using the same, an optical element using the hologram recording medium, and a holographic recording method. The photopolymer composition can more easily provide a photopolymer layer having improved durability against temperature and humidity while having a large refractive index modulation value.

Disclosed herein is an anti-reflective film including: a hard coating layer; and a low-refractive layer containing a binder resin, and hollow inorganic nanoparticles and solid inorganic nanoparticles which are dispersed in the binder resin, wherein the low-refractive layer includes a first layer containing at least 70 vol % of the entire solid inorganic nanoparticles and a second layer containing at least 70 vol % of the entire hollow inorganic nanoparticles, and at the time of fitting polarization ellipticity measured by ellipsometry for the first layer or/and the second layer included in the low-refractive layer using a Cauchy model represented by the following General Equation 1, the second layer satisfies a predetermined condition.

The present invention relates to an antireflection film which exhibits one extremum at a thickness of 35 nm to 55 nm from the surface and exhibiting one extremum at a thickness of 85 nm to 105 nm from the surface in a graph showing the result of Fourier transform analysis for the result of X-ray reflectivity measurement using Cu&#x2014;K-alpha rays.

The present invention relates to an antireflection film including: a hard coating layer in which center line average roughness (Ra) of the surface is 1.2 nm or less and surface energy is 34 mN/m or less; and a low refractive index layer which is formed on the hard coating layer.

Growing community of inventors

Daejeon, South Korea

Seok Hoon Jang